33rd European Photovoltaic Solar Energy Conference and Exhibition; 679-683 2017
DOI: 10.4229/eupvsec20172017-2av.2.33
|View full text |Cite
|
Sign up to set email alerts
|

Nanotextured Silicon Surfaces Using Tailored Voltage Waveform Plasmas: Impact of Ion Bombardment Energy on Etching Dynamics and Passivation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2020
2020
2022
2022

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(2 citation statements)
references
References 0 publications
0
2
0
Order By: Relevance
“…The shape of the waveform can be modified by changing the harmonics amplitude and their phases. In recent years, tailored waveforms played an important role in silicon etching [35,36] and thin film deposition [37,38]. More specifically, a novel type of temporally asymmetric waveform known as sawtooth waveform, which is the family of tailored waveform was introduced by Bruneau et al [39][40][41].…”
Section: Introductionmentioning
confidence: 99%
“…The shape of the waveform can be modified by changing the harmonics amplitude and their phases. In recent years, tailored waveforms played an important role in silicon etching [35,36] and thin film deposition [37,38]. More specifically, a novel type of temporally asymmetric waveform known as sawtooth waveform, which is the family of tailored waveform was introduced by Bruneau et al [39][40][41].…”
Section: Introductionmentioning
confidence: 99%
“…This effect was attributed to the ionization asymmetry that produces more intense ionization on one of the electrodes compared to the other electrode. In processing applications, the use of tailored waveforms played an important role in thin film deposition [51,52] and silicon etching [53,54].…”
Section: Introductionmentioning
confidence: 99%