Nanotechnology with atom optics

Abstract

A brief review of atom optics is presented, with emphasis on how it can be applied in the field of nanotechnology. Two specific examples are discussed: laser-focused atomic deposition and deterministic production of single atoms. Results are summarized for these two techniques, and discussion is presented on how they can impact progress in the development of nanotechnology. Published by Elsevier Ltd.

All-optical atom surface traps implemented with one-dimensional planar diffractive microstructures

“…Manipulation and control of matter at the micro-nano-and atomic level has become increasingly important for the investigation of cold quantum gases [1], atom interferometry [2], quantum information processing [3] and precision positioning of atoms on or under surfaces [4,5]. For the most part magnetic forces have been used in order to take advantage of favorable scaling laws and on-chip integration technologies as component size reduces to the micron scale [6,7,8].…”

Quantum atomic lithography via cross-cavity optical Stern–Gerlach setup

“…Although the cross-cavity OSG has not yet been implemented experimentally, the cross-cavity setup has been built to test Lorentz invariance at the 10 −17 level [10]. In addition to the developments in probing atomic and cavity-field states, atomic lithography-where classical light is used to focus matter on the nanometer scale-has also witnessed considerable progress in recent decades [11][12][13]. The atom-light interaction is manipulated to assemble a structured array of atoms with potential applications to nanotechnology-related fields.…”

“…The atom-light interaction is manipulated to assemble a structured array of atoms with potential applications to nanotechnology-related fields. Beyond the achievements in the growth of spatially periodic and quasi-periodic [14] atomic patterns [11][12][13], recent works have explored the possibility of creating nonperiodic arrays by using complex optical fields [15][16][17].…”

Influence of laser power on deposition of the chromium atomic beam in laser standing wave

“…Compared with the conventional optical lithography, the atom lithography technique in performance has potential advantages. The process of atom lithography is based on two different types of interactional forces that can be used to manipulate neutral atoms by laser field, the atomic beam is collimated and the standing-wave field acts like an array of cylindrical lenses and can focus them onto the substrate and then form the nanometre structure, the spacing between the lines is predictably coincident with the half-wavelength of the optical standing-wave that is used as a light mask [1][2][3] .Since the purpose of direct write atomic lithography is to deposit small features, any influence that contribute to a broadening of the features must be considered [4] . Based on the semi-classical model in this paper, we analyze the motion equation of atoms in the laser standing wave field, and then get the trajectory of the atoms in the standing wave field by analytical simulation.…”

“…Compared with the conventional optical lithography, the atom lithography technique in performance has potential advantages. The process of atom lithography is based on two different types of interactional forces that can be used to manipulate neutral atoms by laser field, the atomic beam is collimated and the standing-wave field acts like an array of cylindrical lenses and can focus them onto the substrate and then form the nanometre structure, the spacing between the lines is predictably coincident with the half-wavelength of the optical standing-wave that is used as a light mask [1][2][3] .…”