Micro‐ and Nanosystems for Biotechnology 2016
DOI: 10.1002/9783527801312.ch6
|View full text |Cite
|
Sign up to set email alerts
|

Nanotechnologies for the Bioelectronic Interface

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
3
0

Year Published

2018
2018
2021
2021

Publication Types

Select...
2
2

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(3 citation statements)
references
References 66 publications
0
3
0
Order By: Relevance
“…In recent years there has been an explosion of work focused on the development and use of nanotechnologies aimed at interacting and interfacing with the brain and central nervous system generally ( Silva, 2006 , 2007a , b , 2008 , 2010 ; Kotov et al, 2009 ; De Vittorio et al, 2014 ; Saxena et al, 2015 ; Badry and Mattar, 2017 ; Scaini and Ballerini, 2017 ; Rosenthal, 2018 ), and in the context of BMI and neural prosthesis in particular ( Webster et al, 2003 ; Lovat et al, 2005 ; Fabbro et al, 2012 ; Nicolas-Alonso and Gomez-Gil, 2012 ; Seo et al, 2013 ; Avants et al, 2016 ; Ha et al, 2016 ; Scaini and Ballerini, 2017 ). Considerable recent effort has focused on nanoscale neurotechnologies aimed at recording from and stimulating from the brain at high densities.…”
Section: Beyond the Current State Of The Art: Machine Learning Enablementioning
confidence: 99%
“…In recent years there has been an explosion of work focused on the development and use of nanotechnologies aimed at interacting and interfacing with the brain and central nervous system generally ( Silva, 2006 , 2007a , b , 2008 , 2010 ; Kotov et al, 2009 ; De Vittorio et al, 2014 ; Saxena et al, 2015 ; Badry and Mattar, 2017 ; Scaini and Ballerini, 2017 ; Rosenthal, 2018 ), and in the context of BMI and neural prosthesis in particular ( Webster et al, 2003 ; Lovat et al, 2005 ; Fabbro et al, 2012 ; Nicolas-Alonso and Gomez-Gil, 2012 ; Seo et al, 2013 ; Avants et al, 2016 ; Ha et al, 2016 ; Scaini and Ballerini, 2017 ). Considerable recent effort has focused on nanoscale neurotechnologies aimed at recording from and stimulating from the brain at high densities.…”
Section: Beyond the Current State Of The Art: Machine Learning Enablementioning
confidence: 99%
“…[20][21][22][23][24][25] Despite implementation of these platforms in a variety of advanced cellular applications-such as in vivo and ex vivo gene editing, recording cellular action potential, and immunomodulation-the development of this burgeoning eld is hindered by a lack of tools allowing for direct, rapid, and dynamic visualization of living cells interacting with these nanostructures. [26][27][28][29][30][31][32] Recent advances in combinatorial nanofabrication routes now offer precise control over SiNWs growth, topological parameters, and array architecture, overcoming the limitations of conventional fabrication that have restricted cell-NW studies. [33][34][35] Combining colloidal lithography techniques, such as convective assembly and self-assembly at liquid-liquid interfaces, with either metal-assisted chemical etching (MACE) or deep reactive ion etching (DRIE), enables controlled VA-SiNWs growth.…”
Section: Introductionmentioning
confidence: 99%
“…[18][19][20][21][22][23] Despite implementation of these platforms in a variety of advanced cellular applications-such as in vivo and ex vivo gene editing, recording cellular action potential, and immunomodulation-the development of this burgeoning eld is hindered by a lack of tools allowing for direct, rapid, and dynamic visualization of living cells interacting with these nanostructures. [24][25][26][27][28][29][30] Recent advances in combinatorial nanofabrication routes now offer precise control over SiNWs growth, topological parameters, and array architecture, overcoming the limitations of conventional fabrication that have restricted cell-NW studies. [31][32][33] Combining colloidal lithography techniques, such as convective assembly and self-assembly at liquid-liquid interfaces, with either metal-assisted chemical etching (MACE) or deep reactive ion etching (DRIE), enables controlled VA-SiNWs growth.…”
Section: Introductionmentioning
confidence: 99%