Nanostructures Development with Atomic Layer Deposition

Zhang, Hulin

doi:10.1002/9783527696406.ch6

Cited by 2 publications

(1 citation statement)

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“…We chose this deposition process because it provides a high material utilization efficiency, and a deposition rate as low as 1 Å/s, which permits a very precise control on both thermodynamics and geometry of the films. Other techniques described in the literature are chemical vapor deposition (CVD) [ 30 ], sputtering [ 31 ], spray pyrolysis [ 32 ] and atomic layer deposition (ALD) [ 33 ]. We have analyzed the structural and electrochemical dependence of the deposited films with temperature, time and Sn composition.…”

Section: Introductionmentioning

confidence: 99%

Nanostructure ITO and Get More of It. Better Performance at Lower Cost

et al. 2020

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In this paper, we investigated how different growth conditions (i.e., temperature, growth time, and composition) allows for trading off cost (i.e., In content) and performance of nanostructured indium tin oxide (ITO) for biosensing applications. Next, we compared the behavior of these functionalized nanostructured surfaces obtained in different growth conditions between each other and with a standard thin film as a reference, observing improvements in effective detection area up to two orders of magnitude. This enhanced the biosensor’s sensitivity, with higher detection level, better accuracy and higher reproducibility. Results show that below 150 °C, the growth of ITO over the substrate forms a homogenous layer without any kind of nanostructuration. In contrast, at temperatures higher than 150 °C, a two-phase temperature-dependent growth was observed. We concluded that (i) nanowire length grows exponentially with temperature (activation energy 356 meV) and leads to optimal conditions in terms of both electroactive surface area and sensitivity at around 300 °C, (ii) longer times of growth than 30 min lead to larger active areas and (iii) the In content in a nanostructured film can be reduced by 10%, obtaining performances equivalent to those found in commercial flat-film ITO electrodes. In summary, this work shows how to produce appropriate materials with optimized cost and performances for different applications in biosensing.

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Section: Introductionmentioning

confidence: 99%

Nanostructure ITO and Get More of It. Better Performance at Lower Cost

et al. 2020

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Low cycles pulsed chemical vapor deposition of polycrystalline anatase TiO₂

Humphreys

Corti

2020

Nano Ex.

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In this work, an atomic layer deposition (ALD) system is used to identify deposition conditions resulting in anisotropic growth and the formation of highly defined polycrystalline anatase titanium dioxide. FESEM, Raman Spectroscopy, and XRD were extensively used to characterize the deposited titania. The ALD parameter refinement resulted in the attainment of a polycrystalline anatase phase titania in as low as 30 cycles, although the final parameter resulted in a pulsed-chemical vapor deposition (pulsed-CVD). This work suggests that the anatase crystal phase’s development is more dependent on deposition process parameters such as precursor pulse, waiting time, and vacuum times than on the number of cycles. Moreover, the developed pulsed-CVD procedure to deposit anatase titania was capable of coating rough aluminum and titanium substrates with polycrystalline anatase titania, highly increasing the potential to be used in other biomedical implants made of different metals such as stainless steel or in other applications such as dielectrics

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Nanostructures Development with Atomic Layer Deposition

Cited by 2 publications

References 78 publications

Nanostructure ITO and Get More of It. Better Performance at Lower Cost

Nanostructure ITO and Get More of It. Better Performance at Lower Cost

Low cycles pulsed chemical vapor deposition of polycrystalline anatase TiO₂

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Nanostructures Development with Atomic Layer Deposition

Cited by 2 publications

References 78 publications

Nanostructure ITO and Get More of It. Better Performance at Lower Cost

Nanostructure ITO and Get More of It. Better Performance at Lower Cost

Low cycles pulsed chemical vapor deposition of polycrystalline anatase TiO2

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Product

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Low cycles pulsed chemical vapor deposition of polycrystalline anatase TiO₂