2019
DOI: 10.3390/molecules25010018
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Nanostructured MoO3 for Efficient Energy and Environmental Catalysis

Abstract: This paper mainly focuses on the application of nanostructured MoO 3 materials in both energy and environmental catalysis fields. MoO 3 has wide tunability in bandgap, a unique semiconducting structure, and multiple valence states. Due to the natural advantage, it can be used as a high-activity metal oxide catalyst, can serve as an excellent support material, and provide opportunities to replace noble metal catalysts, thus having broad application prospects in catalysis. Herein, we comprehensively summarize th… Show more

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Cited by 75 publications
(42 citation statements)
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“…A high η value indicates a poor electroactivity toward water electrolysis. This can be attributed to the weak electrocatalytic activity of MoO 3 for both the HER and the OER, the electrochemical inertness of the graphite substrate, and the relatively high electrochemical stability window of the neutral aqueous electrolyte against water splitting. , Both electrodes exhibit the features of pseudocapacitive materials because of the observed broad redox peaks. , …”
Section: Resultsmentioning
confidence: 99%
“…A high η value indicates a poor electroactivity toward water electrolysis. This can be attributed to the weak electrocatalytic activity of MoO 3 for both the HER and the OER, the electrochemical inertness of the graphite substrate, and the relatively high electrochemical stability window of the neutral aqueous electrolyte against water splitting. , Both electrodes exhibit the features of pseudocapacitive materials because of the observed broad redox peaks. , …”
Section: Resultsmentioning
confidence: 99%
“…[7,30] The RF sputtering technique was selected because of its potential to produce low-cost, uniform, and good quality films with tailored stoichiometry. [31] The quality of the deposited films depend on various deposition parameters. The experimental conditions of thin-film preparation were: (i) sample: MoO 3 (Sigma-Aldrich, purity 99.99%), (ii) substrate: glass substrate, (iii) chamber base pressure: ≈10 −6 mbar, (iv) background argon pressure: 0.03 mbar, (v) magnetron power supply frequency: 13.56 MHz, (vi) RF power: 150 W, (vii) deposition time: 30 min, (viii) substrate-target distance: 5 cm, (ix) post-deposition annealing temperature and time: 400 °C, 1 h. The commercially available MoO 3 powder was ground in an agate mortar with a pestle and was used as the sputtering target.…”
Section: Methodsmentioning
confidence: 99%
“…The reason for selecting molybdenum oxide (MoO 3 ) was because of its extensive use in electronic industry being a type III electrochromic, n-type, wide bandgap material exhibiting photochromic and thermochromic behavior because of its different coordination number, oxidation states, and stoichiometry. [31] Deposition in an inert gas such as argon changes the kinetic energy distribution of particles and significantly influences the resputtering of the deposited materials. During coating, Argon ions collided with the target and ejected the neutral atoms to form the plasma state.…”
Section: Methodsmentioning
confidence: 99%
“…This unique layered structure of α-MoO3 has increases content of pentavalent Mo 5+ ions, which possesses strong affinity to oxygen 49,50 . Since gas sensors function by the reaction between oxygen and adsorbed analyte gas molecules, the presence of Mo 5+ increases the adsorption effect, thus resulting in enhancing the gas sensor response 49,[51][52][53][54] . In recent times, the MoO3 based gas…”
Section: Introductionmentioning
confidence: 99%