2011
DOI: 10.1016/j.surfcoat.2011.06.015
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Nanostructured hard coatings deposited by cathodic arc deposition: From concepts to applications

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Cited by 68 publications
(32 citation statements)
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“…Macroparticle contamination and plasma filtering Contamination is severe without filtering, less with poisoned cathodes (e.g. surface oxidized), acceptable for some applications like hard coatings on tools [278,279]; optical and other applications require filtered arcs [245,280,281].…”
Section: Energies Of Negative Ionsmentioning
confidence: 99%
“…Macroparticle contamination and plasma filtering Contamination is severe without filtering, less with poisoned cathodes (e.g. surface oxidized), acceptable for some applications like hard coatings on tools [278,279]; optical and other applications require filtered arcs [245,280,281].…”
Section: Energies Of Negative Ionsmentioning
confidence: 99%
“…During the arc cathodic evaporation technique, droplets were always generated. They adhered loosely to the coating surface and significantly increased the surface roughness of coatings [22][23][24]. These droplets do not Fig.…”
Section: Characterizations Of the Pinsmentioning
confidence: 99%
“…A0, deformation area; D, wear width; h0, deformation height; h, wear depth Fig. 7 Changes in weights (=initial weights−final weights) of the pins after pin-on-disc tests at 25, 250, and 700°C really represent a problem for applications involving high mechanical loads [22].…”
Section: Characterizations Of the Pinsmentioning
confidence: 99%
“…In contrast to MS methods, the arc plasma can be created by the cathode spots with a extremely high areal power density (on the order of 10 13 W/m 2 ) in CAPE technique, leading to a high deposition rate, high degree of ionization, ion kinetic energies in the range of 10-100 eV, and multiple charge states [13]. The CAPE technique is a high current density and low voltage process, in which a cloud of positive ions near the cathode surface establish a potential barrier of a few tens of volts [14], providing an appropriate kinetic energy of ions to enhance the thin film properties, which are similar to those obtained with ion beam assisted deposition.…”
Section: Accepted Manuscriptmentioning
confidence: 99%