Nanostructured Films by Physical Vapor Deposition for Photocatalytic Applications

Kleiman, A; Xaubet, M.; Márquez, A.

doi:10.1201/9781003183525-15

Cited by 1 publication

(2 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Similar results were found for the other pairs of samples. Thus, N-doping did not significantly affect the crystalline structure of the films, which is consistent with a low dopant content [18,46].…”

Section: Characterization Of the Filmssupporting

confidence: 78%

See 1 more Smart Citation

Efficiency of cathodic arc-grown N-doped TiO₂ films for the photocatalytic reduction of Cr(VI) under UV-Vis irradiation

Kleiman,

Meichtry,

Xaubet

et al. 2023

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

The photocatalytic activity of undoped and N-doped TiO2 anatase films with different thicknesses prepared by cathodic arc deposition (CAD) on glass substrates is reported. After TiO2 deposition, the doping of the films was carried out by plasma immersion ion implantation in a nitrogen environment. The composition of the films was studied by x-ray photoelectron spectroscopy (XPS), the surface morphology was analyzed by atomic force microscopy (AFM) and the crystalline structure was examined by x-ray diffraction (XRD). The thickness was determined by observing the film profile with scanning electron microscopy (SEM). The transmittance of the films in the UV-Vis range was studied as well. The photocatalytic activity of the films was evaluated through the efficiency in the reduction of Cr(VI) in the presence of ethylenediaminetetraacetic acid (EDTA) under UV-Vis irradiation. N-doped films presented a higher photocatalytic efficiency than undoped films: Cr(VI) reduction after 5 h irradiation augmented from 58 (pure TiO2) to 85% (N-doped TiO2) for films of 300 nm thickness, and from 69 to 85% for films with a thickness of 440 nm. On the other hand, pure TiO2 films of 790 nm thickness were more efficient (99% of Cr(VI) reduction) but the effect of doping on the photocatalytic activity was negligible.

show abstract

Section: Characterization Of the Filmssupporting

confidence: 78%

“…Several methods have been used for N-doping TiO 2 films, depending on the technique employed for the deposition or synthesis [10,12,18]. In the case of CAD, doping can be performed during deposition by using an O 2 /N 2 mixture as ambient gas in the chamber [19][20][21].…”

Section: Introductionmentioning

confidence: 99%

Efficiency of cathodic arc-grown N-doped TiO₂ films for the photocatalytic reduction of Cr(VI) under UV-Vis irradiation

Kleiman,

Meichtry,

Xaubet

et al. 2023

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

show abstract

Nanostructured Films by Physical Vapor Deposition for Photocatalytic Applications

Cited by 1 publication

References 0 publications

Efficiency of cathodic arc-grown N-doped TiO₂ films for the photocatalytic reduction of Cr(VI) under UV-Vis irradiation

Efficiency of cathodic arc-grown N-doped TiO₂ films for the photocatalytic reduction of Cr(VI) under UV-Vis irradiation

Contact Info

Product

Resources

About

Nanostructured Films by Physical Vapor Deposition for Photocatalytic Applications

Cited by 1 publication

References 0 publications

Efficiency of cathodic arc-grown N-doped TiO2 films for the photocatalytic reduction of Cr(VI) under UV-Vis irradiation

Efficiency of cathodic arc-grown N-doped TiO2 films for the photocatalytic reduction of Cr(VI) under UV-Vis irradiation

Contact Info

Product

Resources

About

Efficiency of cathodic arc-grown N-doped TiO₂ films for the photocatalytic reduction of Cr(VI) under UV-Vis irradiation

Efficiency of cathodic arc-grown N-doped TiO₂ films for the photocatalytic reduction of Cr(VI) under UV-Vis irradiation