2008
DOI: 10.1088/0957-4484/19/39/395601
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Nanostructural control in solution-derived epitaxial Ce1−xGdxO2−yfilms

Abstract: A novel mechanism based on aliovalent doping, allowing fine tuning of the nanostructure and surface topography of solution-derived ceria films, is reported. While under reducing atmospheric conditions, non-doped ceria films are inherently polycrystalline due to an interstitial amorphous Ce(2)C(3) phase that inhibits grain growth, a high quality epitaxial film can be achieved simply by doping with Gd(3+) cations. Gd(3+) [Formula: see text] Ce(4+) substitutions within the lattice are accompanied by charge-compen… Show more

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Cited by 42 publications
(35 citation statements)
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References 32 publications
(42 reference statements)
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“…Growth of nanostructures was performed under controlled atmosphere (Ar-10 % H 2 or static air) at a maximum temperature of 1000°C during variable times [12,15]. Under these heating conditions it was verified by XPS measurements of films that no C was retained in the films [33]. Atomic Force Microscopy (AFM Molecular Imaging PicoSPM) was used in the tapping mode at room temperature to investigate the different evolution stages of the nanostructures.…”
Section: Methodsmentioning
confidence: 99%
“…Growth of nanostructures was performed under controlled atmosphere (Ar-10 % H 2 or static air) at a maximum temperature of 1000°C during variable times [12,15]. Under these heating conditions it was verified by XPS measurements of films that no C was retained in the films [33]. Atomic Force Microscopy (AFM Molecular Imaging PicoSPM) was used in the tapping mode at room temperature to investigate the different evolution stages of the nanostructures.…”
Section: Methodsmentioning
confidence: 99%
“…These local variations, which are caused by a deteriorating texture, will result in displacements at the surface and in the formation of a higher surface roughness. [27] The optimization of the complete synthesis process results in the following proposed thermal process: an IR-assisted drying stage at 210°C, a calcination ramp of 2°C min -1 , a calcination level of 900°C, a calcination dwell time of 60 min, a sintering ramp of 10°C min -1 , a sintering level of 1050°C and a sintering dwell time of 30 min. The applied Ar/(5%) H 2 flow was kept constant at 80 mL min -1 , which resulted in an appropriate oxygen partial pressure in our tube furnace setup.…”
Section: Resultsmentioning
confidence: 99%
“…This mismatch can be influenced by use of metal substitution. [27,28] CSD methods allow for easy control of this metal substitution on an atomic scale. A further optimization of the surface morphology, on the other hand, will prove to be significantly harder, as the thermal synthesis process has already been fine-tuned.…”
Section: Resultsmentioning
confidence: 99%
“…20,29,30 XPS surface analysis reveals the amount of carbon residue in the homogeneous zone of films quenched from different stages during crystallization, as shown in Fig.3a. Although CO 2 adsorption has influence on the absolute intensity of the C1s peak, it can still be clearly concluded that the evolution of the amount of aliphatic carbon residue is processing dependent, i.e., the amount of carbon decreases with the crystallization proceeding.…”
Section: Surface Texture Dependence On Film Thicknessmentioning
confidence: 99%