2021
DOI: 10.1016/j.mejo.2021.105141
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Nanosheet field effect transistors-A next generation device to keep Moore's law alive: An intensive study

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Cited by 58 publications
(14 citation statements)
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“…Over the past few decades, the information-technology market has grown rapidly, largely because the performance of computing systems has improved significantly over time due to Moore’s law [ 1 , 2 , 3 , 4 ]. Big-data processing is considered a new benchmark in addition to performance, which is of great importance in applications such as the Internet of Things (IoT), autonomous vehicles, and adaptive control and management systems [ 5 , 6 ].…”
Section: Introductionmentioning
confidence: 99%
“…Over the past few decades, the information-technology market has grown rapidly, largely because the performance of computing systems has improved significantly over time due to Moore’s law [ 1 , 2 , 3 , 4 ]. Big-data processing is considered a new benchmark in addition to performance, which is of great importance in applications such as the Internet of Things (IoT), autonomous vehicles, and adaptive control and management systems [ 5 , 6 ].…”
Section: Introductionmentioning
confidence: 99%
“…[432] Researchers have been trying to increase this bandwidth (the pathway between the two systems) by increasing the number of transistors on a chip (following Moore's law); however, the ability to compact more transistors together without losing functionality due to massive heat generation is beginning to slow down as processing nodes decrease past 2-3 nm. [433][434][435] Another approach researchers have taken to mitigate the von Neumann bottleneck is to safely parallelizing data flow between the CPU and memory-like how the brain accesses information using multiple neurons at the same time without any interference. [436] By parallelizing the CPU's data access, one can transfer more information (using the same transfer rate per bandwidth) in the same amount of time.…”
Section: Time Delay In Feedback Sensorsmentioning
confidence: 99%
“…[ 432 ] Researchers have been trying to increase this bandwidth (the pathway between the two systems) by increasing the number of transistors on a chip (following Moore's law); however, the ability to compact more transistors together without losing functionality due to massive heat generation is beginning to slow down as processing nodes decrease past 2–3 nm. [ 433–435 ]…”
Section: Communicationmentioning
confidence: 99%
“…[9][10][11] Recently, the technology node of 7 nm has been mass-produced, and researchers are currently working to develop ICs for the technology nodes of 5 nm and 3 nm. [12][13][14] Traditional silicon manufacturing for IC processing uses ''topdown'' approaches including ultraviolet (UV), deep ultraviolet (DUV), 13.5 nm extreme ultraviolet (EUV) lithography and nanoimprint lithography (NIL), [15][16][17][18][19][20][21] which are executed by a lengthy and complicated process consisting of stepper exposure, photoresist development, bake, acid etching, etc., and heavily rely on the technology development of both lithography machines and chemical photoresists. Hence, it is essential to pay close attention to the ''bottom-up'' fabrication method as a potential alternative technology for the nano-manufacture of ICs.…”
Section: Introductionmentioning
confidence: 99%