2007
DOI: 10.1016/j.apsusc.2007.01.076
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Nanoscopic photodeposited structures analyzed by an evanescent optical method

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Cited by 12 publications
(21 citation statements)
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“…The DELI technique developed [9,10] is an optical far field technique used for probing nanometer thickness profiles in the z-direction, i.e., into the depth of the surface samples. It uses the scattered evanescent optical light intensity pattern scattered from the deposited particles at the substrate/interface from a visible wide spectra light beam propagating through the glass substrate which serves also as light waveguide.…”
Section: Deli Results Of the Nanolayers Morphologymentioning
confidence: 99%
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“…The DELI technique developed [9,10] is an optical far field technique used for probing nanometer thickness profiles in the z-direction, i.e., into the depth of the surface samples. It uses the scattered evanescent optical light intensity pattern scattered from the deposited particles at the substrate/interface from a visible wide spectra light beam propagating through the glass substrate which serves also as light waveguide.…”
Section: Deli Results Of the Nanolayers Morphologymentioning
confidence: 99%
“…As discussed in Refs [9,10] we assume that evanescent fields generated by TIR in the waveguide are transformed by the deposited nanolayer into scattered outward propagating waves, which reach the CCD camera and are captured as images of varying light intensity. In our DELI phenomenological model, we assume that the evanescent field in the air close to the waveguide is perturbed and scattered by the deposited a-Se particles.…”
Section: Discussionmentioning
confidence: 99%
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“…In this work we used the differential evanescent light intensity imaging (DELI) method developed previously [6,7] for imaging large areas (hundreds of mm 2 ) nanothin layers of polyethylene (PE) obtained by the Matrix Assisted Pulsed Laser Evaporation (MAPLE) technique [8] which is basically similar to Pulsed Laser Deposition (PLD) [9].…”
Section: Introductionmentioning
confidence: 99%