2019
DOI: 10.1063/1.5115480
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Nanoscale tensile strain in perfect silicon crystals studied by high-resolution X-ray diffraction

Abstract: A device was designed, built, and tested to apply small tensile strain to perfect single silicon crystals. It was used on the second axis of a double crystal diffractometer to obtain controllable strain fields. The strain field quality was evaluated by double crystal X-ray diffractometry. The dependence of atomic plane distances on applied stress was determined. Stress-strain curves were obtained from fitted rocking curves in the Bragg-Bragg and Bragg-Laue configurations. These results show that it is possible… Show more

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Cited by 2 publications
(4 citation statements)
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“…1. The non-dispersive double-crystal setup with the second crystal being the one to be stretched is basically the same as the setup used to explore the tensile strain in perfect Si single crystals (Cusatis, 2019), but with three modifications: (i) Since we are focusing on Bragg case diffraction and are not requiring high tension values, for simplicity, we decided to use a rectangular-shape stretched Si single-crystal blade, taken from a commercially available FZ double-side-polished Si wafer (400 mm thick). (ii) The reference flat and perfect Si 400 single crystal [9 Â 9 mm (H Â V) Â 400 mm thick], also taken from a commercially available FZ double-side-polished Si wafer, was attached in the same angular-rotation axis and on the surface (bottom half) of the stretched crystal with a drop of water.…”
Section: Methodsmentioning
confidence: 99%
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“…1. The non-dispersive double-crystal setup with the second crystal being the one to be stretched is basically the same as the setup used to explore the tensile strain in perfect Si single crystals (Cusatis, 2019), but with three modifications: (i) Since we are focusing on Bragg case diffraction and are not requiring high tension values, for simplicity, we decided to use a rectangular-shape stretched Si single-crystal blade, taken from a commercially available FZ double-side-polished Si wafer (400 mm thick). (ii) The reference flat and perfect Si 400 single crystal [9 Â 9 mm (H Â V) Â 400 mm thick], also taken from a commercially available FZ double-side-polished Si wafer, was attached in the same angular-rotation axis and on the surface (bottom half) of the stretched crystal with a drop of water.…”
Section: Methodsmentioning
confidence: 99%
“…The clamps on the traction device are the same as those used in the previous experiment (Cusatis, 2019). The clamp housing was patterned with knurled grooves to 400 mm (depth) Â 18 Â 10 mm (H Â V).…”
Section: Methodsmentioning
confidence: 99%
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