Nanoscale studies of Ag electrodeposition on HOPG (0001)

Pötzschke, R.T.; Gervasi, C.A.; Vinzelberg, Stefan; Staikov, G.; Lorenz, W.J.

doi:10.1016/0013-4686(95)00049-k

Cited by 52 publications

(45 citation statements)

References 13 publications

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“…5) which act as active sites. Similar results were obtained with other systems employing HOPG as a substrate [22,23]. In the very initial deposition stages of the present case, hemispherical Zn crystallites with similar sizes were formed, in good agreement with the instantaneous nucleation mechanism indicated previously.…”

Section: Morphological Studiessupporting

confidence: 93%

“…Integration of both cathodic and anodic peaks gave a charge ratio Q c =Q a > 1. This behaviour was already observed in other systems [22,23] and explained in terms of a residual metal deposit on the HOPG surface intercalated into the carbon. If the electrode potential was maintained at E ¼ À500 mV for a sufficient time, Q c =Q a % 1 and the successive voltammograms were reproducible.…”

Section: Voltammetric Responsementioning

confidence: 50%

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Nucleation and growth of Zn on HOPG in the presence of gelatine as additive

Alvarez

Salinas

2004

Journal of Electroanalytical Chemistry

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Section: Morphological Studiessupporting

confidence: 93%

Section: Voltammetric Responsementioning

confidence: 50%

Nucleation and growth of Zn on HOPG in the presence of gelatine as additive

Alvarez

Salinas

2004

Journal of Electroanalytical Chemistry

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“…1c, dotted line͒, silver deposition starts at a slightly positive potential at around −0.04 V and that the reduction peak shifts with about 0.14 V toward positive potential. Such a shift is observed by other authors 10,14,15 and explained by the fact that during the first cycle not all the electrodeposited silver on the HOPG electrode was dissolved, whereas during the second cycle the deposition occurs on the residual silver islands left on the surface after the first cycle. This suggests that the oxidation of silver after the first cycle is not complete and that no new nuclei appear on the HOPG electrode, which means that the saturation of all the nucleation sites has taken place during the first cycle.…”

Section: Resultsmentioning

confidence: 67%

Metallic Nanostructure Formation Using Self-Assembled Chemically Anchored Gold Nanoparticles

Taleb

Mangeney

Ivanova

2011

J. Electrochem. Soc.

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In the present work, the formation of silver nano-and mesopourous structures on highly oriented pyrolytic graphite ͑HOPG͒ modified with self-assembled gold nanoparticles ͑Au NPs͒ is demonstrated. To illustrate the patterning effect with nanometer resolution of Au NPs, a comparison between silver electrodeposition on bare HOPG ͑0001͒ substrate and Au NP-modified HOPG ͑0001͒ surface is performed. On bare HOPG substrate the electrodeposition occurs on terraces, steps, and surface defects according to the well known Volmer-Weber island growth mechanism. Whereas on the Au NP-modified HOPG substrate, silver deposition results in a very different morphology: nanostructures ͑mesoporous films for longer deposition time͒ are formed on the entire electrode surface. Field emission gun scanning electron microscopy, energy dispersive spectrometry and X-ray photoelectron spectroscopy are used to reveal the selective deposition of silver on Au NPs during the first stage of the electrodeposition process. At the later stage due to coalescence, mesoporous silver film is formed. The possible mechanism for silver ions penetration and reduction on single Au NP with n-dodecanethiol shell is discussed.For different nanotechnological applications the fabrication of nanostructured materials with a well defined pattern size and shape is a key point. [1][2][3][4][5] In fact, the physical properties associated with such material depend on the size, 6 the morphology, 7 and the organization of the pattern. 1 For the preparation of such nanostructures two approaches were used: direct deposition 8 and deposition on modified substrate. 9 Direct deposition approaches usually achieve disordered surface structures because of the preferential nucleation at crystalline defects and step edges. [10][11][12][13][14][15] To overcome this problem a modified substrate with patterns acting as preferential nucleation sites is proposed. Among the techniques used for metal deposition, the electrochemical deposition became versatile tools for surface structuring and modification at nanometer scale. 10-16 It is relatively cheap and highly selective in that the new phase is deposited on the desired location.The surface nanostructuring by electrodeposition depends on its roughness in terms of whether there template or chemically modified substrate is used. 17 Dos Santos Claro et al. showed that silver coated nanocavities act as preferred sites for silver electrodeposition. 17 In fact, the concave surface lowers the chemical potential of the adatoms which favor its reduction. For small silver particles which act as a convex surface, a negative shift in the standard electrode potential was observed, 18 which is explained by the fact that a convex surface is more easily oxidized than a flat surface. To achieve certain surface roughness ͑concave or convex surface͒ or to pattern it, different strategies are used: irradiation, 19 deposition, 8-16 and etching. 20 Another strategy used to create surface patterning and preferential nucleation sites for electrodeposition at...

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“…Our approach also differs from recent methods combining scanning probe techniques and electrochemical methods for surface structuring (9). In those methods, the spatial resolution stems from limited diffusion of the electrolyte ions (10)(11)(12)(13)(14)(15), mechanical modifications by the electrochemically modified tip apex (16), or geometrical confinement of the electrolyte volume (1 7,18).…”

mentioning

confidence: 94%

Electrochemical Micromachining

Schuster

Kirchner

Allongue

et al. 2000

Science

569

347

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The application of ultrashort voltage pulses between a tool electrode and a workpiece in an electrochemical environment allows the three-dimensional machining of conducting materials with submicrometer precision. The principle is based on the finite time constant for double-layer charging, which varies linearly with the local separation between the electrodes. During nanosecond pulses, the electrochemical reactions are confined to electrode regions in close proximity. This technique was used for local etching of copper and silicon as well as for local copper deposition.

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Nanoscale studies of Ag electrodeposition on HOPG (0001)

Cited by 52 publications

References 13 publications

Nucleation and growth of Zn on HOPG in the presence of gelatine as additive

Nucleation and growth of Zn on HOPG in the presence of gelatine as additive

Metallic Nanostructure Formation Using Self-Assembled Chemically Anchored Gold Nanoparticles

Electrochemical Micromachining

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