Nanoscale Pattern Definition on Nonplanar Surfaces Using Ion Beam Proximity Lithography and Conformal Plasma-Deposited Resist

Parikh, D.; Craver, Barry; Nounu, Hatem N.; Fong, F. O.; Wolfe, J. C.

doi:10.1109/jmems.2008.921730

Cited by 16 publications

(10 citation statements)

References 30 publications

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“…These dry‐applied resists overcome the shortcomings associated with patterning using traditional solution‐deposited polymer photoresists 431, 432. The conformal nature of CVD allows application of resist layers onto non‐planar substrates 300, 433. Furthermore, eliminating “wet processing” prevents pattern collapse of high‐aspect‐ratio features during drying,434 avoids solvent residues and impurities,432, 434 and reduces the negative environmental impact associated with large volumes of solvent 300…”

Section: Example Applicationsmentioning

confidence: 99%

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

et al. 2010

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Chemical vapor deposition (CVD) polymerization utilizes the delivery of vapor-phase monomers to form chemically well-defined polymeric films directly on the surface of a substrate. CVD polymers are desirable as conformal surface modification layers exhibiting strong retention of organic functional groups, and, in some cases, are responsive to external stimuli. Traditional wet-chemical chain- and step-growth mechanisms guide the development of new heterogeneous CVD polymerization techniques. Commonality with inorganic CVD methods facilitates the fabrication of hybrid devices. CVD polymers bridge microfabrication technology with chemical, biological, and nanoparticle systems and assembly. Robust interfaces can be achieved through covalent grafting enabling high-resolution (60 nm) patterning, even on flexible substrates. Utilizing only low-energy input to drive selective chemistry, modest vacuum, and room-temperature substrates, CVD polymerization is compatible with thermally sensitive substrates, such as paper, textiles, and plastics. CVD methods are particularly valuable for insoluble and infusible films, including fluoropolymers, electrically conductive polymers, and controllably crosslinked networks and for the potential to reduce environmental, health, and safety impacts associated with solvents. Quantitative models aid the development of large-area and roll-to-roll CVD polymer reactors. Relevant background, fundamental principles, and selected applications are reviewed.

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Section: Example Applicationsmentioning

confidence: 99%

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

et al. 2010

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“…That is a function of the particular application for which the accelerated particles are suitable. In next generation lithography technologies, the aim is to design systems capable of creating patterns of dimensions in the sub-100 nm domain [22].…”

Section: Discussionmentioning

confidence: 99%

Direct acceleration of ions to low and medium energies by a crossed-laser-beam configuration

Salamin

2011

Phys. Rev. ST Accel. Beams

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Calculations show that 10 keV helium and carbon ions, injected midway between two identical 1 TW-power crossed laser beams of radial polarization, can be accelerated in vacuum to energies of utility in ion lithography. As examples, identical laser beams, crossed at 10 and focused to waist radii of 7:42 m, accelerate He 2þ and C 6þ ions to average kinetic energies near 75 and 165 keV over distances averaging less than 7 and 6 mm, respectively. The spread in kinetic energy in both cases is less than 1% and the particle average angular deflection is less than 7 mrad. More energy-demanding industrial applications require higher-power laser beams for their direct ion laser acceleration.

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“…Nanomanupulation plays major role in the field of nanofabrication. Nanomanupulation is a technique in which some specific tools are used to manipulate the objects in nanoscale (Parikh, 2008). At present, Scanning Probe microscopic methods involved in AFM [Davis, 2003) and Scanning Tunneling Microscopy (STM) are being used to manipulate the objects in nanometer scale.…”

Section: Introductionmentioning

confidence: 99%

Nanolithography

Venugopal¹,

Kim²

2013

Advances in Micro/Nano Electromechanical Systems and Fabrication Technologies

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Nanoscale Pattern Definition on Nonplanar Surfaces Using Ion Beam Proximity Lithography and Conformal Plasma-Deposited Resist

Cited by 16 publications

References 30 publications

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

Direct acceleration of ions to low and medium energies by a crossed-laser-beam configuration

Nanolithography

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