Nanoscale Molecular Patterns Fabricated by Using Scanning Near-Field Optical Lithography

Sun, Shuqing; Chong, Karen S. L.; Leggett, Graham J.

doi:10.1021/ja017673h

Cited by 132 publications

(128 citation statements)

References 23 publications

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“…The conditions need to be optimised each time the tip is replaced. The 40 nm line presented is the smallest FHMW measured for a UV deprotection SAM to date and compares well to SNOM patterning using deep UV light [57][58][59].…”

Section: Nanoscale Patterningsupporting

confidence: 58%

Photo-deprotection patterning of self-assembled monolayers

Critchley

Ducker

Bramble

et al. 2007

Journal of Experimental Nanoscience

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Photo-deprotectable self-assembled monolayers (SAMs) provide a versatile platform for creating functional patterned surfaces. In this study, we present nanoscale photo-patterning, multi-component patterning, and a method for producing molecular gradients using photodeprotectable SAMs. Nanoscale patterning of photo-deprotectable SAMs was achieved by coupling a UV laser (365 nm) through a scanning near field probe to produce nanoscale lines of $40 nm, i.e. /9. Multi-component patterning was achieved by a two-stage method combining both microcontact printing and soft-UV photo-patterning. The example demonstrated in this study produced a three-component patterned surface with regions of CF 3 , CH 3 and COOH/ CF 3 functionality. The versatility of these photocleavable SAMs is further demonstrated by creating linear molecular gradients of two functionalities along a distance of $25 mm. The use of 'soft' UV gives several advantages including the ability to pattern SAMs with micron-scale features over large areas quickly, with greater control over the photochemical reactions, and compatibility with existing lithographic facilities thus offering an effective alternative to other patterning methods such microcontact-printing or deep UV patterning.

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Section: Nanoscale Patterningsupporting

confidence: 58%

Photo-deprotection patterning of self-assembled monolayers

Critchley

Ducker

Bramble

et al. 2007

Journal of Experimental Nanoscience

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“…9͒ and self-assembled monolayers of oligo͑ethylene glycol͒ terminated alkanethiolates. [10][11][12] However, polymer patterning is difficult on small length scales, and while self-assembled monolayers of alkanethiolates, [13][14][15][16][17][18][19] alkylsiloxanes, [20][21][22] and alkylphosphonates [23][24][25][26] have been patterned by a variety of methods, they are not without problems. Alkanethiolate selfassembled monolayers ͑SAMs͒ are rarely defect-free and exhibit limited oxidative stability, while siloxane films exhibit low degrees of order.…”

Section: Introductionmentioning

confidence: 99%

Micro- and Nanostructured Poly[oligo(ethylene glycol)methacrylate] Brushes Grown From Photopatterned Halogen Initiators by Atom Transfer Radical Polymerization

et al. 2011

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Photolithographic techniques have been used to fabricate polymer brush micro- and nanostructures. On exposure to UV light with a wavelength of 244 nm, halogens were selectively removed from films of chloromethylphenyltrichlorosilane and 3-(2-bromoisobutyramido)propyl-triethoxysilane on silicon dioxide. Patterning was achieved at the micrometer scale, by using a mask in conjunction with the incident laser beam, and at the nanometer scale, by utilizing interferometric lithography (IL). Friction force microscopy images of patterned surfaces exhibited frictional contrast due to removal of the halogen but no topographical contrast. In both cases the halogenated surface was used as an initiator for surface atom-transfer radical polymerization. Patterning of the surface by UV lithography enabled the definition of patterns of initiator from which micro- and nanostructured poly[oligo(ethylene glycol)methacrylate] bottle brushes were grown. Micropatterned brushes formed on both surfaces exhibited excellent resistance to protein adsorption, enabling the formation of protein patterns. Using IL, brush structures were formed that covered macroscopic areas (approximately 0.5 cm2) but exhibited a full width at half maximum height as small as 78 nm, with a period of 225 nm. Spatially selective photolytic removal of halogens that are immobilized on a surface thus appears to be a simple, rapid, and versatile method for the formation of micro- and nanostructured polymer brushes and for the control of protein adsorption.

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“…[9] Recently, there has been extensive research into methods for pattern generation based on self-assembled monolayers (SAMs), because patterned SAMs can not only be used as masks [10] or templates [11,12] to construct nanostructures, but can also be used, in combination with other instruments and techniques, to fabricate nanomaterials. Based on the above concept, a series of methods has been developed to fabricate patterned, self-assembled monolayers, including soft lithography (or microcontact printing), [13] dip-pen-nanolithography, [14] nearfield optical lithography, [15] scanning probe lithography, [16,17] and others.…”

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confidence: 99%