“…At the top of this list is lithium phosphorus oxynitride, LiP x O y N z (LiPON), − due to its many advantages such as its relatively high ionic conductivity, good electrochemical stability against Li metal, and low enough electronic conductivity. In addition to the aforementioned properties, thin LiPON films are transparent and can be deposited as part of flexible TFBs. , So far, a variety of advanced gas-phase thin-film deposition techniques have been adopted for the growth of LiPON films on planar substrates, including sputtering, − pulsed laser deposition (PLD), metal–organic chemical vapor deposition (CVD), and atomic layer deposition (ALD). ,− The line-of-sight operation mode in both sputtering , and PLD makes them unsuitable for complex 3D geometries. On the other hand, CVD techniquesespecially ALD, which is based on self-saturating surface reactionsare anticipated to yield uniform and conformal coatings on complex 3D structures with large ARs .…”