Nanoporous membrane production via block copolymer lithography for high heat dissipation systems

Lundy, Ross; Flynn, Shauna P.; Cummins, Cian; Kelleher, Susan M.; Collins, Maurice N.; Dalton, Eric; Daniels, Stephen; Morris, Michael A.; Enright, Ryan

doi:10.1109/itherm.2016.7517693

Cited by 7 publications

(6 citation statements)

References 30 publications

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“…Gate voltage scaling at these dimensions necessitates state-of-the-art architectures beyond FinFETs such as gate-all-around FET technology, leading to further integration complexity 4 . Approaches complimenting photolithography include nanoimprint lithography 5,6 , block copolymer lithography [7][8][9][10][11][12][13][14] and, recently, area selective deposition (ASD) [15][16][17] . Such methods are favorable in enabling future device integration and help alleviate fabrication demands, e.g.…”

Section: Introductionmentioning

confidence: 99%

“…Continued miniaturization of semiconductor devices has led to cost and integration issues which challenge the manufacture of a 3 nm node as envisaged by semiconductor foundries for 2023. , Gate voltage scaling at these dimensions necessitates state-of-the-art architectures beyond fin field-effect transistors (FETs) such as the gate-all-around FET technology, leading to further integration complexity . Approaches complimenting photolithography include nanoimprint lithography, , block copolymer lithography, − and, recently, area-selective deposition (ASD). − Such methods are favorable in enabling future device integration and help alleviate fabrication demands, for example, litho-etch–litho-etch.…”

Section: Introductionmentioning

confidence: 99%

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Precise Definition of a “Monolayer Point” in Polymer Brush Films for Fabricating Highly Coherent TiO₂ Thin Films by Vapor-Phase Infiltration

et al. 2020

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We describe a versatile bottom-up approach to covalently and rapidly graft hydroxyl terminated poly (2-vinyl pyridine) (P2VP-OH) polymers in 60 seconds that can subsequently be used to fabricate high quality TiO2 films on silicon substrates. A facile strategy based upon room temperature titanium vapor phase infiltration of the grafted P2VP-OH polymer brushes produces TiO2 nanofilms of 2-4 nm thickness. In order to fabricate coherent inorganic films with precise thickness control, it is critical to generate a high-quality polymer brush film i.e. a complete monolayer. Definition of precise and regular polymer monolayers is straightforwardly achieved for polymers which are weakly interacting with one another and the substrate (apart from the reactive terminal group used for grafting). However this is much more challenging for reactive systems. Crucial parameters are explored including molecular weight and solution concentration for grafting dense P2VP-OH monolayers from the liquid phase with very high coverage and uniformity across wafer scale areas. Additionally, we compare the P2VP-OH polymer system with another reactive polymer PMMA-OH and a relatively non-reactive polymer PS-OH, the latter we prove to be extremely effective for surface blocking and deactivation. Our methodology provides new insight into the grafting of polymer brushes and their ability to form dense TiO2 films. We believe the results described herein are important for further expanding the use of reactive and unreactive polymers for fields including area selective deposition, solar cell absorber layers and antimicrobial surface coatings.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Precise Definition of a “Monolayer Point” in Polymer Brush Films for Fabricating Highly Coherent TiO₂ Thin Films by Vapor-Phase Infiltration

et al. 2020

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“…For logic and memory integration, applications can range from the low-κ films that sustain electrical isolation between interconnects through to the high-κ gate oxide. Usage has even been extended to high-contrast oxide etch masks during device fabrication. , …”

Section: Introductionmentioning

confidence: 99%

“…Usage has even been extended to high-contrast oxide etch masks during device fabrication. 14,15 Diverse methods have been studied hitherto in the ASD field encompassing the use of self-assembled monolayers and unreactive polymer layers. These have been combined with atomic layer deposition (ALD) in order to deposit precise metal or dielectric layers.…”

Section: ■ Introductionmentioning

confidence: 99%

Optimizing Polymer Brush Coverage To Develop Highly Coherent Sub-5 nm Oxide Films by Ion Inclusion

et al. 2019

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Area-selective deposition is a promising technique for positional self-alignment of materials at a prepatterned surface. Critical to this is the development of molecular systems that have selective surface binding and can act as templates to material growth. This paper reports how end functionalized polymers can be used to create oxide films through a grafting method. Here, we detail a facile approach for rapid grafting (in seconds) of polymer brush films with complete coverage over large areas with high uniformity (pinhole free). Subsequent conversion to an oxide (∼3−4 nm thickness) is performed via liquid-phase metal ion infiltration. Exposing the covalently grafted polymer brush (P2VP-OH) to a metal salt-solvent solution (using the Al 3+ ion as a model species) swells the polymer, facilitating ion inclusion. Early results suggest that a solvent-mediated approach to polymer film infiltration can be used to develop inorganic films in a facile process. While data shows inclusion into both large-area and patterned films, the mechanism and understanding of these have been limited. In particular, the solution-mediated process described here shows the precise tailoring of nanometer-thin polymer films that are pinhole-free and that can be activated to create semiconductor-compatible oxide films that are parallel in quality to ALD-or CVD-derived processes. A surface deactivation strategy is also realized using a hydroxyl-terminated polystyrene (PS-OH) brush that prevents the deposition of ions. We consider this strategy as a means to prevent electromigration of ions as well as the possibility of coating ALD layers.

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“…Applications include, but are not restricted to, hard-disk drive and magnetic storage devices [ 126 , 132 , 133 , 134 , 135 ], nanophotonics and plasmonics materials [ 136 , 137 , 138 ], or chemical sensors [ 139 ]. Most often, BCPs are still used as templates for patterning, as in the case of graphene structuring [ 140 , 141 , 142 , 143 ], the fabrication of nanoporous membranes [ 144 , 145 , 146 , 147 , 148 ] or energy storage, photovoltaics and batteries [ 149 , 150 , 151 , 152 ]. In other applications, however, BCPs can present a more active role and can be used as stabilizing agent, for surface functionalization [ 153 , 154 , 155 , 156 ] or to aid in nanoparticle self-assembly [ 157 ].…”

Section: Block Copolymers For the Fabrication Of Functional Devicementioning

confidence: 99%

Directed Self-Assembly of Block Copolymers for the Fabrication of Functional Devices

et al. 2020

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Directed self-assembly of block copolymers is a bottom-up approach to nanofabrication that has attracted high interest in recent years due to its inherent simplicity, high throughput, low cost and potential for sub-10 nm resolution. In this paper, we review the main principles of directed self-assembly of block copolymers and give a brief overview of some of the most extended applications. We present a novel fabrication route based on the introduction of directed self-assembly of block copolymers as a patterning option for the fabrication of nanoelectromechanical systems. As a proof of concept, we demonstrate the fabrication of suspended silicon membranes clamped by dense arrays of single-crystal silicon nanowires of sub-10 nm diameter. Resulting devices can be further developed for building up high-sensitive mass sensors based on nanomechanical resonators.

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Nanoporous membrane production via block copolymer lithography for high heat dissipation systems

Cited by 7 publications

References 30 publications

Precise Definition of a “Monolayer Point” in Polymer Brush Films for Fabricating Highly Coherent TiO₂ Thin Films by Vapor-Phase Infiltration

Precise Definition of a “Monolayer Point” in Polymer Brush Films for Fabricating Highly Coherent TiO₂ Thin Films by Vapor-Phase Infiltration

Optimizing Polymer Brush Coverage To Develop Highly Coherent Sub-5 nm Oxide Films by Ion Inclusion

Directed Self-Assembly of Block Copolymers for the Fabrication of Functional Devices

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Nanoporous membrane production via block copolymer lithography for high heat dissipation systems

Cited by 7 publications

References 30 publications

Precise Definition of a “Monolayer Point” in Polymer Brush Films for Fabricating Highly Coherent TiO2 Thin Films by Vapor-Phase Infiltration

Precise Definition of a “Monolayer Point” in Polymer Brush Films for Fabricating Highly Coherent TiO2 Thin Films by Vapor-Phase Infiltration

Optimizing Polymer Brush Coverage To Develop Highly Coherent Sub-5 nm Oxide Films by Ion Inclusion

Directed Self-Assembly of Block Copolymers for the Fabrication of Functional Devices

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Product

Resources

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Precise Definition of a “Monolayer Point” in Polymer Brush Films for Fabricating Highly Coherent TiO₂ Thin Films by Vapor-Phase Infiltration

Precise Definition of a “Monolayer Point” in Polymer Brush Films for Fabricating Highly Coherent TiO₂ Thin Films by Vapor-Phase Infiltration