Nanoporous alumina enhanced surface plasmon resonance sensors

Abstract

The signal enhancement of an easy to fabricate, nanoporous alumina assisted surface plasmon resonance ͑SPR͒ sensor is investigated. It is theoretically shown that the presence of a thin ͑under 200 nm͒ porous alumina layer on top of an aluminum film supporting the surface plasmons, may significantly increase ͑over one order of magnitude͒ the sensitivity of the SPR method in the case where the adsorption of relatively small molecules is probed. The comparative experimental investigation of self-assembled monolayer formation on planar metal films and porous alumina layers verifies the theoretical predictions. Based on these results, we discuss the extended applicability of this setup in biosensor and other related applications.

Modeling of dye-sensitized titanium dioxide solar cells

“…A fuller simulation of the DSSC should include, in the effective medium, the electrolyte as well. In this consideration, a theoretical approach for the dielectric constant of the effective medium consisting of three parts [23] should be used. Modeling of DSSCs based on more complicated structures that have been reported to give high efficiency values [24] is also included in our future work.…”

Angular Resolutions of the Porous Anodic Alumina/Aluminum Photonic-Plasmonic Sensors

“…The angular measurements of PAA/Aluminum (Al) films in DI-water at p polarization are studied and it is mentioned that detection of small refractive index (RI) changes in liquids is possible [1]. Studies indicate generating additional electromagnetic modes and improving (narrowing and deepening) their resonance curves can improve sensor's resolution for better sensing [1][2][3].…”

Structural and optical characterizations of porous anodic alumina–aluminum nanocomposite films on borofloat substrates

“…In the literature, there are some studies that investigate PAA films created by the anodization of Al films with thicknesses in the range of 30 to 2000 nm. Anodization of thinner Al films is preferred to be in sulfuric acid with low voltages between 18 and 25 V. 24 The films thicker than 100 nm are anodized with oxalic acid in the voltage range of 30 to 40 V. 21 In order to get pores with larger dimensions, phosphoric acid is used at 80 V. 16 The anodization voltage is also related to the initial Al thickness. Anodization of thinner Al films is preferred to be in sulfuric acid with low voltages between 18 and 25 V. 24 The films thicker than 100 nm are anodized with oxalic acid in the voltage range of 30 to 40 V. 21 In order to get pores with larger dimensions, phosphoric acid is used at 80 V. 16 The anodization voltage is also related to the initial Al thickness.…”