Nanopatterning in a compact setup using table top extreme ultraviolet lasers

Abstract

The recent development of

Extreme ultraviolet lithography with table top lasers

“…With the Lloyd's mirror interferometer set up it is possible to print large area or regular lines with periods below 100 nm in a single exposure [51,77,83,84]. Fig.…”

Surface Percolation and Growth. An alternative scheme for breaking the diffraction limit in optical patterning

“…The far field optical lithography, both in projection and scanning, has a first principle limitation in size reduction, the diffraction limit, as light cannot be focused below a size of about half the wavelength used. The main approach to circumvent this problem is to reduce the light wavelength and this is the roadmap traced by the semiconductor industry [13], now using less than 100nm sources mostly from synchrotron radiation but also from other new developments such as short wavelength lasers [13,14]. Another approach is to avoid the far field limit by near field approaches [15], but these techniques suffer from the same drawbacks of other sophisticated scanning methods, slow throughput and small scanning areas, unless very sophisticated tricks are developed [16].…”

Holographic imaging with a nanometer resolution using compact table-top EUV laser

“…Since that time holography was widely used in numerous applications, some of them requir− ing an increased spatial resolution. On this path, reducing the illumination wavelength is a direct way to improve the resolution both in nanopatterning [4,5] and holographic ima− ging described herein. This is the reason why short wave− length sources such as synchrotrons, EUV and soft X−ray la− sers, high harmonics generation sources etc.…”