Nanoparticles, Proteins, and Nucleic Acids: Biotechnology Meets Materials Science

Niemeyer, Christof M.

doi:10.1002/1521-3773(20011119)40:22<4128::aid-anie4128>3.3.co;2-j

Cited by 231 publications

(243 citation statements)

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“…molecular selfassembly, carbon nanotube synthesis) in which nanostructures are assembled out of smaller units, like atoms or molecules. The miniaturization process finds its application in a large variety of fields, such as microelectronics, biology [15], chemistry, optics and optoelectronics [16][17][18]. The continuous need of society for faster computers, high-density data storage [19] and high-speed information processing is the leading force behind nanofabrication in the industrial world.…”

Section: Nanotechnologymentioning

confidence: 99%

Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

2009

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In the past decade, the feature size in ultra large-scale integration (ULSI) has been continuously decreasing, leading to nanostructure fabrication. Nowadays, various lithographic techniques ranging from conventional methods (e.g. photolithography, x-rays) to unconventional ones (e.g. nanoimprint lithography, self-assembled monolayers) are used to create small features. Among all these, resist-based electron beam lithography (EBL) seems to be the most suitable technique when nanostructures are desired. The achievement of sub-20-nm structures using EBL is a very sensitive process determined by various factors, starting with the choice of resist material and ending with the development process. After a short introduction to nanolithography, a framework for the nanofabrication process is presented. To obtain finer patterns, improvements of the material properties of the resist are very important. The present review gives an overview of the best resolution obtained with several types of both organic and inorganic resists. For each resist, the advantages and disadvantages are presented. Although very small features (2-5 nm) have been obtained with PMMA and inorganic metal halides, for the former resist the low etch resistance and instability of the pattern, and for the latter the delicate handling of the samples and the difficulties encountered in the spinning session, prevent the wider use of these e-beam resists in nanostructure fabrication. A relatively new e-beam resist, hydrogen silsesquioxane (HSQ), is very suitable when aiming for sub-20-nm resolution. The changes that this resist undergoes before, during and after electron beam exposure are discussed and the influence of various parameters (e.g. pre-baking, exposure dose, writing strategy, development process) on the resolution is presented. In general, high resolution can be obtained using ultrathin resist layers and when the exposure is performed at high acceleration voltages. Usually, one of the properties of the resist material is improved to the detriment of another. It has been demonstrated that aging, baking at low temperature, immediate exposure after spin coating, the use of a weak developer and development at a low temperature increase the sensitivity but decrease the contrast. The surface roughness is more pronounced at low exposure doses (high sensitivity) and high baking temperatures. A delay between exposure and development seems to increase both contrast and the sensitivity of samples which are stored in a vacuum after exposure, compared to those stored in air. Due to its relative novelty, the capabilities of HSQ have not been completely explored, hence there is still room for improvement.Applications of this electron beam resist in lithographic techniques other than EBL are also discussed. Finally, conclusions and an outlook are presented.

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Section: Nanotechnologymentioning

confidence: 99%

Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

2009

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“…Learning from Nature means taking ideas from Nature and developing novel functional materials based on these concepts, as has been the case for, e.g., bio-inorganic materials (biomineralization), [1] bioinspired, multiscale structured materials (chiral morphologies), [2] bio-nanomaterials (bio-nanoparticles), [3] hybrid organic/inorganic implant materials (bonelike composites), [4] and smart biomaterials. [5,6] These bioinspired, smart materials are attracting more and more interest because of their unique properties, which have paved the way to many real-world applications, e.g., biomimetic fins, [7] actively moving polymers, [8] neural memory devices, [9] smart micro-/nanocontainers for drug delivery, [10] various biosensors, [11][12][13] dual/multi-responsive materials.…”

Section: Introductionmentioning

confidence: 99%

Bio‐Inspired, Smart, Multiscale Interfacial Materials

2008

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In this review a strategy for the design of bioinspired, smart, multiscale interfacial (BSMI) materials is presented and put into context with recent progress in the field of BSMI materials spanning natural to artificial to reversibly stimuli‐sensitive interfaces. BSMI materials that respond to single/dual/multiple external stimuli, e.g., light, pH, electrical fields, and so on, can switch reversibly between two entirely opposite properties. This article utilizes hydrophobicity and hydrophilicity as an example to demonstrate the feasibility of the design strategy, which may also be extended to other properties, for example, conductor/insulator, p‐type/n‐type semiconductor, or ferromagnetism/anti‐ferromagnetism, for the design of other BSMI materials in the future.

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“…or metal-ion coordination as basic interactions between the components. Due to these two properties, DNA molecules seem particularly suitable to be used as components for the construction of nanometer scale devices [23][24][25][26]. The idea of using DNA in molecular devices is its natural function of storing and coding the genetic information.…”

Section: Dna Biomolecular Electronicsmentioning

confidence: 99%

Biomolecules and Pure Carbon Aggregates: An Application Towards “Green Electronics”

Srivastava¹

2018

Green Electronics

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Abstract"Green electronics" is a novel scientific term which aims to identify the compounds of natural origin (economically safe and biodegradable) and establish economically efficient route for production of synthetic materials. The purpose of green electronics is to create path for the production of human and environmental friendly electronics and the integration of electronics with living tissue in particular. These researches may help to fulfill not only the organic electronics to deliver low cost energy efficient materials and devices, but also achieve unimaginable functionalities for electronics. In this chapter we have considered the molecular electronic devices biomolecules: deoxyribonucleic acid (DNA) and pure carbon aggregates: (carbon nanotubes (CNTs)/graphene), their properties and applications.

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Nanoparticles, Proteins, and Nucleic Acids: Biotechnology Meets Materials Science

Cited by 231 publications

References 0 publications

Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

Bio‐Inspired, Smart, Multiscale Interfacial Materials

Biomolecules and Pure Carbon Aggregates: An Application Towards “Green Electronics”

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