2003
DOI: 10.1063/1.1554756
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Nanometer-scale metallic grains connected with atomic-scale conductors

Abstract: We describe a technique for connecting a nanometer-scale gold grain to leads by atomic-scale gold point contacts. These devices differ from previous metallic quantum dots in that the conducting channels are relatively well-transmitting. We investigate the dependence of the Coulomb blockade on contact resistance. The high-resistance devices display Coulomb blockade and the low-resistance devices display a zero-bias conductance dip, both in quantitative agreement with theory. We find that in the intermediate reg… Show more

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Cited by 26 publications
(39 citation statements)
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“…Large voltage introduces strong-disorder in the nanojunction, through processes such as electromigration, surface atom diffusion, and intermixing with H 2 O and O 2 molecules. [8] Au films to the left and right of the nanojunction are good metals with resistivity ≈ 35µΩcm. Through scanning electron microscopy combined with in situ transport measurements, we determined that the nanojunctions were homogeneous at length scale comparable to the gap size (we determined that the sample resistance was inversely proportional to width w in Fig.…”
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confidence: 99%
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“…Large voltage introduces strong-disorder in the nanojunction, through processes such as electromigration, surface atom diffusion, and intermixing with H 2 O and O 2 molecules. [8] Au films to the left and right of the nanojunction are good metals with resistivity ≈ 35µΩcm. Through scanning electron microscopy combined with in situ transport measurements, we determined that the nanojunctions were homogeneous at length scale comparable to the gap size (we determined that the sample resistance was inversely proportional to width w in Fig.…”
mentioning
confidence: 99%
“…We create these nanojunctions by making electric contacts between two Au films at large bias voltage. [8,9] To summarize, Au atoms are deposited in high vacuum over two bulk Au films separated by a ∼ 70nm slit, as sketched in Fig. 2-B.…”
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confidence: 99%
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“…Examples include atomic-scale gaps formed by mechanically controlled break junctions, 1-6 electrodeposition, 7-11 and electromigration. [12][13][14] In these fabrication techniques, one can determine whether a junction has atomic-scale dimensions by changing the conductance of the junction around the conductance quantum G Q ϭe 2 /h. Discrete steps in conductance of order G Q indicate that the contacts have atomicscale dimensions.…”
Section: Introductionmentioning
confidence: 99%
“…This scheme works remarkably well in cases where the gaps and the contacts are formed in ultrahigh-vacuum ͑UHV͒ conditions, such as mechanically controlled break junctions at cryogenic temperatures. 15 Some schemes for generating atomic-scale gaps involve exposure of these gaps to non-UHV environment, such as air 12,14 or ionic solutions. [7][8][9][10][11] In this case, intermixing between atoms in the leads and impurity molecules ͑such as H 2 O) can degrade the quality of the gaps.…”
Section: Introductionmentioning
confidence: 99%