“…Integrated circuit (IC) technologies are resulting in the required advances through size reductions following Moore's law (Jackson et al, 2005), and this leads to an industrial competition of shrinking lithography (Ronse et al, 2004;Blaikie et al, 2006;Eloy and Depeyrot, 2006;Henry et al, 2006;Zell, 2006). Recently, Moore's law appears to slow down, and the capacity-doubling period has become three years towards five, with the passing of the lithographic threshold of 10 nm being postponed to 2015 (Eloy and Depeyrot, 2006). Precision manufacturing of silicon and various substrates also face more new challenges (Shankar and Zhong, 2006;Young et al, 2006;Paehler et al, 2007;Schoenfelder et al, 2007).…”