Nanomaterials and Equipment for Chemical–Mechanical Polishing of Single-Crystal Sapphire Wafers
Shaoping Li,
Jieni Fu,
Zhaobo He
et al.
Abstract:Single-crystal sapphire (α-Al2O3) has been widely used in semiconductor, optics, communication, national defense, and other fields. Before application, an ultra-smooth surface which is scratch free and subsurface damage free is essential. Furthermore, the sapphire has unique qualities such as significant rigidity and chemical stability, which make it extremely arduous to process. Chemical mechanical polishing (CMP) is recognized as the final process to reduce the roughness and eliminate surface defects of a sa… Show more
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