Nanolayer (Ti,Cr)N coatings for hard particle erosion resistance

Wolfe, Douglas E.; Gabriel, Brian; Reedy, Michael W.

doi:10.1016/j.surfcoat.2011.03.121

Cited by 36 publications

(15 citation statements)

References 25 publications

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“…(8) and (9), for a deposition temperature of 1000 K, and for a N 2 atmosphere with partial pressure P = 0.1 Pa, are c ) estimated for the as-deposited TiN thin films from electrical resistivity measurements [68]. By multiplying these concentrations with D V and…”

Section: Discussionmentioning

confidence: 99%

“…Due to excellent physical and mechanical properties, including high hardness [1][2][3] and toughness [4,5], chemical inertness [6], thermal stability [7], and good electrical conductivity [3], transition metal (TM) nitrides are widely applied as wear-resistant protective coatings for cutting tools [8] and engine components [9] and as diffusion barriers in electronic devices [10,11]. The properties and performances of TM nitride thin films depend on their micro-and nanostructure.…”

Section: Introductionmentioning

confidence: 99%

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Nitrogen vacancy, self-interstitial diffusion, and Frenkel-pair formation/dissociation inB1TiN studied byab initioand classical molecular dynamics with optimized potentials

et al. 2015

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We use ab initio and classical molecular dynamics (AIMD and CMD) based on the modified embedded-atom method (MEAM) potential to simulate diffusion of N vacancy and N self-interstitial point defects in B1 TiN. TiN MEAM parameters are optimized to obtain CMD nitrogen point-defect jump rates in agreement with AIMD predictions, as well as an excellent description of TiN x (∼0.7 < x 1) elastic, thermal, and structural properties. We determine N dilute-point-defect diffusion pathways, activation energies, attempt frequencies, and diffusion coefficients as a function of temperature. In addition, the MD simulations presented in this paper reveal an unanticipated atomistic process, which controls the spontaneous formation of N self-interstitial/N vacancy (N I /N V ) pairs (Frenkel pairs), in defect-free TiN. This entails that the N lattice atom leaves its bulk position and bonds to a neighboring N lattice atom. In most cases, Frenkel-pair N I and N V recombine within a fraction of ns; ∼50% of these processes result in the exchange of two nitrogen lattice atoms (N−N Exc ). Occasionally, however, Frenkel-pair N-interstitial atoms permanently escape from the anion vacancy site, thus producing unpaired N I and N V point defects.

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Section: Discussionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Nitrogen vacancy, self-interstitial diffusion, and Frenkel-pair formation/dissociation inB1TiN studied byab initioand classical molecular dynamics with optimized potentials

et al. 2015

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“…We conclude based on the analysis of the experimental results that the MP filtration by negative bias voltage was the hybrid effect of ion bombardment and electrical repulsion. MPs classified as coating defects are typically incorporated into thin films deposited by AIP and are typically a few microns in diameter [34,35]. These defects were confirmed as liquid MPs because they were primarily spherical in shape and rich in Ti, as revealed by EDS.…”

Section: Surface Topography and Macroparticlesmentioning

confidence: 99%

Influence of negative bias voltage on microstructure and property of Al-Ti-N films deposited by multi-arc ion plating

Cai

Chen

et al. 2017

Ceramics International

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In this study, we systematically investigated the effects of negative bias voltage on the composition, deposition efficiency, microstructure, and mechanical properties of multi-arc ion plated (MAIP) AlTiN films. The films were deposited on high-speed steel substrates by MAIP at various negative bias voltages. The results indicated that the Al content [Al/(Al+Ti) ratio] and the deposition efficiency were significantly altered by the application of negative bias voltages. X-ray photoelectron spectroscopy analysis showed that the AlTiN films were composed of TiN and Al-N bonds. The macroparticles (MPs) on the film surface decreased with increasing negative bias voltage. We also discussed the different types of MPs found on the films and their influence on the process of determining the hardness of the films. The microhardness of the films depends on the negative bias voltages. The films deposited at-250 V exhibited a maximum hardness of ~45 GPa. The adhesion and frictional tests revealed that the film deposited at-150 V demonstrated the highest cracking resistance, the best adhesion under a critical load of 78 N, highest adhesion strength, and the lowest and stablest coefficient of friction at 0.23.

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“…An increasing amount of attention is now focused on ternary Ti-Cr-N coatings. Researchers have reported that new ternary Ti-Cr-N coatings have hightemperature strength compared to CrN and TiN coatings [13,[22][23][24][25][26][27][28]. However, most of these have scarcely been investigated.…”

Section: A R C H I V E O F S I Dmentioning

confidence: 99%

Characterization of TiN, CrN and (Ti, Cr) N Coatings Deposited by Cathodic ARC Evaporation

Akbarzadeh

Shafyei²,

Salimijazi

2014

IJE

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In this investigation, physical vapor deposited Ti-Cr-N coatings were coated on tool steel substrates using reactive arc evaporation. Microstructure and mechanical properties of coatings such as roughness, thickness, phase composition, hardness, Young’s modulus and coefficient of friction were studied. Phase compositions were investigated by X-ray diffraction method. Surface microstructure and morphology were studied using scanning electron microscope (SEM) and coating compositions were determined by energy dispersive spectroscopy (EDS). Mechanical properties were measured by nano indentation. The friction behavior of the coatings were investigated using ball-on-disc tests under normal loads of 7 N.The results showed that (Ti, Cr)N and TiN coatings consisted of only one cubic phase solid solution, while CrN coatings consisted of hexagonal Cr2N and cubic CrN phases. Average grain size of the coatings was found to be in the range of 14 to 20 nm. Mechanical behavior of the (Ti, Cr)N coatings was related to the Ti content, i.e. hardness decreased with decreasing Ti content. doi: 10.5829/idosi.ije.2014.27.07a.1

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Nanolayer (Ti,Cr)N coatings for hard particle erosion resistance

Cited by 36 publications

References 25 publications

Nitrogen vacancy, self-interstitial diffusion, and Frenkel-pair formation/dissociation inB1TiN studied byab initioand classical molecular dynamics with optimized potentials

Nitrogen vacancy, self-interstitial diffusion, and Frenkel-pair formation/dissociation inB1TiN studied byab initioand classical molecular dynamics with optimized potentials

Influence of negative bias voltage on microstructure and property of Al-Ti-N films deposited by multi-arc ion plating

Characterization of TiN, CrN and (Ti, Cr) N Coatings Deposited by Cathodic ARC Evaporation

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