2019
DOI: 10.1016/j.pmatsci.2018.09.002
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Nanoindentation/scratching at finite temperatures: Insights from atomistic-based modeling

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Cited by 49 publications
(10 citation statements)
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“…This is also consistent with a significant reduction in the critical loading (Pc) for the first pop-in event to take place, as seen in Figure 2. This behavior also can be observed in the experimental results of Pt (100) [39] and the multiscale modeling of Al [40] during nanoindentation. The values of hardness and Young's modulus of the Co thin films as a function of annealing temperature are plotted in Figure 3(a).…”
Section: Resultssupporting
confidence: 65%
“…This is also consistent with a significant reduction in the critical loading (Pc) for the first pop-in event to take place, as seen in Figure 2. This behavior also can be observed in the experimental results of Pt (100) [39] and the multiscale modeling of Al [40] during nanoindentation. The values of hardness and Young's modulus of the Co thin films as a function of annealing temperature are plotted in Figure 3(a).…”
Section: Resultssupporting
confidence: 65%
“…It is undeniable that MD simulations technology plays an increasingly crucial role in nanomachining process to reveal hitherto unknown phenomena [ 99 ]. This review concluded the recent progress in MD simulation of TBN method, and the above contents are summarized as follows: The establishment of MD models of various materials and related potential function were summarized.…”
Section: Discussionmentioning
confidence: 99%
“…24 As the validity of MD simulations considerably hinges on the choice of interatomic potential, it is crucial to employ an appropriate interatomic potential so as to attain accurate results. [25][26][27][28][29][30] Atomic interactions of SiC are modelled using the effective many-body interatomic potential developed by Vashishta et al, 31 which is capable of reasonably reproducing the generalized stacking fault energies, cohesive energy, elastic constants, and melting point of 3C-SiC. The initial nanocrystalline structure is generated using the Voronoi tessellated method.…”
Section: Simulation Methodologymentioning
confidence: 99%