2010
DOI: 10.1039/c0an00053a
|View full text |Cite
|
Sign up to set email alerts
|

Nanohole arrays in chemical analysis: manufacturing methods and applications

Abstract: Since the last decade, nanohole arrays have emerged from an interesting optical phenomenon to the development of applications in photophysical studies, photovoltaics and as a sensing template for chemical and biological analyses. Numerous methodologies have been designed to manufacture nanohole arrays, including the use of focus ion beam milling, soft-imprint lithography, colloidal lithography and, more recently, modified nanosphere lithography (NSL). With NSL or colloidal lithography, the experimental conditi… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

1
118
0

Year Published

2011
2011
2018
2018

Publication Types

Select...
5
2
1

Relationship

0
8

Authors

Journals

citations
Cited by 127 publications
(119 citation statements)
references
References 96 publications
1
118
0
Order By: Relevance
“…3 However, this technique can be rather slow in the fabrication process of large pattern areas (as for EBL, only small areas of the order of about 10 4 µm 2 can be fabricated with a reasonable cost). 4 …”
Section: Focused Ion Beam Lithographymentioning
confidence: 97%
See 1 more Smart Citation
“…3 However, this technique can be rather slow in the fabrication process of large pattern areas (as for EBL, only small areas of the order of about 10 4 µm 2 can be fabricated with a reasonable cost). 4 …”
Section: Focused Ion Beam Lithographymentioning
confidence: 97%
“…[1][2][3][4][5][6] In this part we generally discuss the fabrication of ordered arrays of nanoparticles, emphasizing the possibility of producing arrays of nanospheres.…”
Section: Fabrication Possibilitiesmentioning
confidence: 99%
“…NSL advantages include low-cost, high-throughput, compatibility with many materials, and the capability of producing wellordered arrays on different substrates [105] . Nanostructures such as nanopillars [106] , nanohole arrays [107] , nanowire arrays [108] , nanobowls [109] , nanotriangles [104] , nanorings [110] , and nanocrescents [49] have been fabricated successfully for LSPR and SERS applications. However, NSL has several disadvantages.…”
Section: Nanosphere Lithography (Nsl)mentioning
confidence: 99%
“…Generally, SF 6 , O 2 and Ar are used as the reactive gases. Plasma bombardment can produce an isotropic etching process, and induce size's reduction of the PS spheres on the substrate but keep the hexagonally arranged structure of the PS's spheres.…”
Section: Etching Of the As-prepared Close-packed Colloidal Monolayermentioning
confidence: 99%
“…Periodically arranged nanostructured arrays are an important basis of next-generation devices and have potential applications in fields such as optics [1], electronics [2], optoelectronics [3], information storage [4], super-hydrophobicity [5], biological and chemical sensing [6], and surface-enhanced Raman scattering (SERS)-based devices [7][8][9]. Thus far, there have been many methods developed to fabricate these arrays, including aluminum oxide (AAO) template technique [10,11], nano-imprint lithography [12], electron beam ligthography [13] and colloidal lithography [14][15][16], etc.…”
Section: Introductionmentioning
confidence: 99%