2001
DOI: 10.1016/s0375-9601(01)00078-0
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Nanofilms of Si clusters confined in SiO nanoparticles prepared by low energy cluster beam deposition

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Cited by 12 publications
(6 citation statements)
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“…The nanocluster beam finally was deposited onto the surface of the PZT film through the open holes of the mask. The details on LECBD process could be found in our previous work [5,6]. After deposition, not taking off the mask, a Pt electrode 978-1-4244-2891-5/08/$25.00 © 2008 IEEE.…”
Section: Resultsmentioning
confidence: 99%
“…The nanocluster beam finally was deposited onto the surface of the PZT film through the open holes of the mask. The details on LECBD process could be found in our previous work [5,6]. After deposition, not taking off the mask, a Pt electrode 978-1-4244-2891-5/08/$25.00 © 2008 IEEE.…”
Section: Resultsmentioning
confidence: 99%
“…The evolution of Si layer on the surface of Si-coated sample is indicated by the intense peak Si 2p at a binding energy of ~98.9 eV [38,39]; however, a relatively weak peak at ~102.9 eV can be assigned to silicon dioxide (Fig. 2) [16,40].…”
Section: Figmentioning
confidence: 99%
“…The clusters are deposited on the substrate by a soft-landing manner and accumulated randomly but they do not coalesce with each other. Based on this technique, various cluster-assembled nanostructured films such as metal and oxide have been prepared, which show peculiar properties different from the films prepared by the common methods [52][53][54][55]. Since the size, mass, and the assembling manner of the clusters can be precisely tuned by changing the working gas flow, controlling the length of condensation region, changing the buffer gas, and so forth, it is possible to control the microstructures and properties of the cluster-assembled nanostructured films, which makes it an ideal candidate for the fabrication of single phase or heterostructured films.…”
Section: Low Energy Cluster Beam Depositionmentioning
confidence: 99%