2003
DOI: 10.1021/la0349368
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Nanofibrillar Surfaces via Reactive Ion Etching

Abstract: The reactive ion etching of poly(ethylene terephthalate) using various gas compositions was examined. A radio frequency power supply operating at 30 kHz was used to produce plasmas from the following gases and 50:50 gas mixtures: Ar, N2, O2, Ar-N2, Ar-O2, and N2-O2. Exposure times were typically 10, 20, and 30 min. The relatively inert gases and gas mixtures (Ar, N2, Ar-N2) produced a polygonal pattern of protrusions surrounding shallow cavities. In contrast, the presence of oxygen or oxygen-containing plasmas… Show more

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Cited by 44 publications
(41 citation statements)
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References 49 publications
(116 reference statements)
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“…In semicrystalline polymers, nanometer-sized roughness was observed on cellulose fibres after oxygen plasma treatment [1]. Microsized aligned ridges [2], nanosized bumps [3] and fibrils [4] with 20 nm in diameter and up to 300 nm in length were observed after oxidative plasma treatment of PET films. Nanotextures have also been observed in amorphous polymers, i.e.…”
Section: Introductionmentioning
confidence: 99%
“…In semicrystalline polymers, nanometer-sized roughness was observed on cellulose fibres after oxygen plasma treatment [1]. Microsized aligned ridges [2], nanosized bumps [3] and fibrils [4] with 20 nm in diameter and up to 300 nm in length were observed after oxidative plasma treatment of PET films. Nanotextures have also been observed in amorphous polymers, i.e.…”
Section: Introductionmentioning
confidence: 99%
“…Nanofibrillar surfaces on polymers can be formed through RIE using various gas compositions. 107 Figure 3 shows PET surface etched with a 50:50 O 2 -N 2 gas mixture for 30 min under a radio frequency power supply operating at 30 kHz. The dimensions of these fibrils are around 300 nm in length and 20 nm in diameter.…”
Section: Nanofibers and Nanotubesmentioning
confidence: 99%
“…The predominant active species in radio frequency plasma are positive ions and photons, with ability of breaking primary chemical bonds and inducing cross-linking [26,27]. The extent of degradation in plasma etching is closely correlated to the chemical structure of the polymer at a given plasma working condition [5,[28][29][30][31][32]. It was reported that polymeric structures containing oxygen were more susceptible to plasma while polymers with high crystal and stable structures were more resistant to oxidation and etching [30,32].…”
Section: Introductionmentioning
confidence: 99%