2011
DOI: 10.1002/ppap.201000164
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Nanofibrillar Patterns on PET: The Influence of Plasma Parameters in Surface Morphology

Abstract: This manuscript studies the formation of nanopatterns onto PET films under different experimental conditions. Homogeneous patterns with randomly distributed bumps or nanofibrils were observed depending on the plasma parameters. The influence of the power, oxygen pressure and electrode charge in the etching rate and final nanotopography is studied and discussed. The superhydrophobic properties of the nanostructured films are analysed.

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Cited by 33 publications
(26 citation statements)
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“…This process was also described as micro and nanotexturing of polymers, and gave superhydrophilic nanostructured surfaces, while a subsequent fluorocarbon plasma deposition [29] could render them superhydrophobic and antireflective as described in Tserepi et al [30], Vourdas et al [31] and Kontziampasis et al [32]. Plasma nanotexturing was also used in low density plasma etching reactors by many other groups, see for example the work by Wohlfart et al [33], [34] for PET, Balu for paper [35], Fernández-Blázquez [36] for various organic polymers, Palumbo et al [ Fig. 2(iv) shows PC (left) and PS (right) surfaces [38], Fig.…”
Section: Randomly Nanostructured Surfaces Via Plasma Etching or Deposmentioning
confidence: 94%
“…This process was also described as micro and nanotexturing of polymers, and gave superhydrophilic nanostructured surfaces, while a subsequent fluorocarbon plasma deposition [29] could render them superhydrophobic and antireflective as described in Tserepi et al [30], Vourdas et al [31] and Kontziampasis et al [32]. Plasma nanotexturing was also used in low density plasma etching reactors by many other groups, see for example the work by Wohlfart et al [33], [34] for PET, Balu for paper [35], Fernández-Blázquez [36] for various organic polymers, Palumbo et al [ Fig. 2(iv) shows PC (left) and PS (right) surfaces [38], Fig.…”
Section: Randomly Nanostructured Surfaces Via Plasma Etching or Deposmentioning
confidence: 94%
“…In addition, the surface of deposited film was charged during the plasma discharge and this charging affected the formation of the peaks on the surface. The effects of plasma on the nanotopography of surfaces have been recently noticed and investigated more and more …”
Section: Resultsmentioning
confidence: 99%
“…g., [51][52][53][54][55][56][57][58]) that depending on the substrate material and treatment conditions (pressure, ion During the etching process, not only the morphology, but also surface chemical structure is altered. Therefore, in order to produce surfaces with the desired chemical composition, roughened surfaces are coated by thin films of plasma polymers with required properties.…”
Section: Deposition Of Plasma Polymers On Stochastically-roughened Sumentioning
confidence: 99%