2023
DOI: 10.1515/nanoph-2023-0217
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Nanofabrication: the unsung hero in enabling advances in nanophotonics

Pan Chengfeng,
Zhang Shutao,
Maria Farsari
et al.
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Cited by 3 publications
(2 citation statements)
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“…[31][32][33][34][35] For several decades, electron-beam lithography (EBL) has been used to fabricate metasurfaces with subwavelength structures that are smaller than the diffraction limit of photolithography. [36][37][38][39][40] However, EBL encounters various problems, such as high cost, low productivity, and difficulty in forming patterns over large areas. Recently, the development of semiconductor processes has facilitated the use of ArF laser photolithography to fabricate subwavelength-sized metasurfaces.…”
Section: Introductionmentioning
confidence: 99%
“…[31][32][33][34][35] For several decades, electron-beam lithography (EBL) has been used to fabricate metasurfaces with subwavelength structures that are smaller than the diffraction limit of photolithography. [36][37][38][39][40] However, EBL encounters various problems, such as high cost, low productivity, and difficulty in forming patterns over large areas. Recently, the development of semiconductor processes has facilitated the use of ArF laser photolithography to fabricate subwavelength-sized metasurfaces.…”
Section: Introductionmentioning
confidence: 99%
“…This positive insight holds promising implications for the realm of all-dielectric nanophotonics, providing an added incentive to enhance nanofabrication technology and attain sub-10 nm gaps. A narrowing of the nanogap is clearly one of the best ways to improve a nanoantenna’s performance, however it remains extremely challenging to consistently control on multiple structures. …”
mentioning
confidence: 99%