Nanofabrication of 30 nm Au zone plates by e-beam lithography and pulse voltage electroplating for soft x-ray imaging

Zhu, Jiancai; Chen, Yifang; Xie, Shanshan; Zhang, Lijuan; Wang, Chunpeng; Tai, Renzhong

doi:10.1016/j.mee.2020.111254

Cited by 11 publications

(7 citation statements)

References 19 publications

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“…We observe that plating of nanostructures with good quality was possible with a DC current approach. This is in contrast to work by Zhu et al [ 5 ] which found pulse plating necessary for a smooth filling of the mold (although at 30 nm outermost zone instead of 50 nm). We think that DC plating is preferable if possible, since it eliminates two parameters, frequency and duty cycle, and simplifies the process.…”

Section: Results and Discussioncontrasting

confidence: 93%

“…Gold electroplating is a frequently used technique for the fabrication of gold micro- and nanostructures [ 1 , 2 , 3 , 4 ]. An important application area is X-ray imaging and X-ray microscopy, where different gold structures are used as optical elements, e.g., test patterns, gratings or zone plates [ 5 , 6 ]. Typically, these structures are fabricated by depositing a polymer resist on top of a substrate covered with a thin metal plating base, followed by either optical or electron-beam lithography.…”

Section: Introductionmentioning

confidence: 99%

“…Traditionally, cyanide-based gold plating baths have been used since they are very stable and reliable [ 2 , 5 , 7 ]. These baths are, however, highly toxic, utilizing cyanide gold complexes in combination with thallium- or arsenic-based brighteners.…”

Section: Introductionmentioning

confidence: 99%

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Miniaturized Sulfite-Based Gold Bath for Controlled Electroplating of Zone Plate Nanostructures

et al. 2022

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X-ray zone plates made from gold are common optical components used in X-ray imaging experiments. These nanostructures are normally fabricated using a combination of electron-beam lithography and gold electroplating with cyanide gold baths. In this study, we present a gold electroplating process in a miniaturized gold-suplphite bath. The miniaturization is enabled by on-chip reference plating areas with well defined sizes, offering a reliable way to control the height of the structures by carefully choosing the plating time at a given current density in accordance with a calibration curve. Fabricated gold zone plates were successfully used in X-ray imaging experiments with synchrotron radiation. Although gold electroplating of nanostructures is a well-established method, details about the actual process are often missing in the literature. Therefore, we think that our detailed descriptions and explanations will be helpful for other researchers that would like to fabricate similar structures.

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Section: Results and Discussioncontrasting

confidence: 93%

Section: Introductionmentioning

confidence: 99%

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Miniaturized Sulfite-Based Gold Bath for Controlled Electroplating of Zone Plate Nanostructures

et al. 2022

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“…The first is direct electron-beam patterning either of an organic or inorganic resist mold. The mold is then filled with a metal by electrodeposition [7,8] or covered with a metal layer by atomic layer deposition [9,10]. The second method transfers the zone plate pattern into a metal layer by deep reactive ion etching [11,12].…”

Section: Introductionmentioning

confidence: 99%

Metal-Assisted Chemical Etching and Electroless Deposition for Fabrication of Hard X-ray Pd/Si Zone Plates

et al. 2020

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Zone plates are diffractive optics commonly used in X-ray microscopes. Here, we present a wet-chemical approach for fabricating high aspect ratio Pd/Si zone plate optics aimed at the hard X-ray regime. A Si zone plate mold is fabricated via metal-assisted chemical etching (MACE) and further metalized with Pd via electroless deposition (ELD). MACE results in vertical Si zones with high aspect ratios. The observed MACE rate with our zone plate design is 700 nm/min. The ELD metallization yields a Pd density of 10.7 g/cm 3 , a value slightly lower than the theoretical density of 12 g/cm 3 . Fabricated zone plates have a grid design, 1:1 line-to-space-ratio, 30 nm outermost zone width, and an aspect ratio of 30:1. At 9 keV X-ray energy, the zone plate device shows a first order diffraction efficiency of 1.9%, measured at the MAX IV NanoMAX beamline. With this work, the possibility is opened to fabricate X-ray zone plates with low-cost etching and metallization methods.

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“…This is important for a newcomer and experienced researcher or engineer working in the field to go fast forward to TPP -(Towards Perfect Polymerization). [20] and [21] 2 Light matter-interaction mechanisms…”

mentioning

confidence: 99%

Photopolymerization Mechanisms at a Spatio-temporally Ultra-confined Light

Skliutas¹,

Lebedevaite²,

Kabouraki³

et al. 2020

Preprint

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Ultrafast laser 3D lithography based on non-linear light-matter interactions, widely known as multi-photon lithography (MPL), offers unrivaled precision rapid prototyping and flexible additive manufacturing options. 3D printing equipment based on MPL are already commercially available, yet there is still no comprehensive understanding of factors determining spatial resolution, accuracy, fabrication throughput, repeatability, and standardized metrology methods for the accurate characterization of the produced 3D objects and their functionalities. The photoexcitation mechanisms, spatial-control or photo-modified volumes, and the variety of processable materials are topics actively investigated. The complexity of the research field is underlined by limited understanding and fragmented knowledge of light-excitation and material response. Research to date has only provided case-specific findings on photoexcitation, chemical modification, and material characterization of the experimental data. In this review, we aim to provide a consistent and comprehensive summary of the existing literature on photopolymerization mechanisms under highly confined spatial and temporal conditions, where, besides the excitation and cross-linking, parameters such as diffusion, temperature accumulation, and the finite amount of monomer molecules start to become of critical importance. Key parameters such as, photoexcitation, polymerization kinetics, and the properties of the additively manufactured materials at the nanoscale in 3D are examined, whereas, the perspectives for future research and as well as emerging applications are outlined.

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Nanofabrication of 30 nm Au zone plates by e-beam lithography and pulse voltage electroplating for soft x-ray imaging

Cited by 11 publications

References 19 publications

Miniaturized Sulfite-Based Gold Bath for Controlled Electroplating of Zone Plate Nanostructures

Miniaturized Sulfite-Based Gold Bath for Controlled Electroplating of Zone Plate Nanostructures

Metal-Assisted Chemical Etching and Electroless Deposition for Fabrication of Hard X-ray Pd/Si Zone Plates

Photopolymerization Mechanisms at a Spatio-temporally Ultra-confined Light

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