Nanofabrication by scanning probe microscope lithography: A review

Tseng, Ampere A.; Notargiacomo, A.; Chen, T. P.

doi:10.1116/1.1926293

Cited by 414 publications

(245 citation statements)

References 98 publications

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“…[1][2][3][4] This method is based on the field-induced activation of molecules within a water meniscus and the subsequent oxidation of the sample surface. [5][6][7] Local oxidation nanolithography has been applied to fabricate nanoscale electronic devices, 8,9 microelectromechanical systems 10 or templates for the direct growth of single-molecule magnets 11 or metallic nanoparticles.…”

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confidence: 99%

Nanopatterning of carbonaceous structures by field-induced carbon dioxide splitting with a force microscope

García¹,

Losilla²,

Martínez³

et al. 2010

Applied Physics Letters

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We report a tip-based nanofabrication method to generate carbon nanopatterns. The process uses the field-induced transformation of carbon dioxide gas into a solid material. It requires the application of low-to-moderate voltages ϳ10-40 V. The method allow us to fabricated sub-25 nm dots and it can be up scaled to pattern square centimeter areas. Photoemission spectroscopy shows that the carbon is the dominating atomic species of the fabricated structures. The formation of carbon nanostructures and oxides by atomic force microscope nanolithography expands its potential by providing patterns on the same sample with different chemical composition.

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mentioning

confidence: 99%

Nanopatterning of carbonaceous structures by field-induced carbon dioxide splitting with a force microscope

García¹,

Losilla²,

Martínez³

et al. 2010

Applied Physics Letters

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“…Atomic force microscopy ͑AFM͒ oxidation nanolithography is a robust and flexible tip-based nanofabrication method [1][2][3][4][5] that is used to fabricate high resolution patterns and nanoscale devices. Thus, templates to build molecular architectures, 6,7 resist masks, 8 nanomechanical resonators, 9,10 or several nanoelectronic devices and transistors [11][12][13][14] have been fabricated by local oxidation.…”

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confidence: 99%

Nanoscale space charge generation in local oxidation nanolithography

Chiesa¹,

García²

2010

Applied Physics Letters

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We have measured the surface potential and the space charge generated during the first stages of atomic force microscopy field-induced oxidation. Space charge densities are about 10 17 cm −3 for oxidation times below 10 ms. In a dry atmosphere, the surface potential is negative. However, in humid air the surface potential could be either positive or negative. This effect is attributed to a screening effect of the water molecules. These results explain and support the use of local oxidation patterns as templates for building molecular architectures. They also establish the space charge build up as an intrinsic feature in local oxidation experiments. © 2010 American Institute of Physics. ͓doi:10.1063/1.3459976͔Atomic force microscopy ͑AFM͒ oxidation nanolithography is a robust and flexible tip-based nanofabrication method [1][2][3][4][5] that is used to fabricate high resolution patterns and nanoscale devices. Thus, templates to build molecular architectures, 6,7 resist masks, 8 nanomechanical resonators, 9,10 or several nanoelectronic devices and transistors [11][12][13][14] have been fabricated by local oxidation. In AFM oxidation, the tip is used as a cathode and the water meniscus formed between the tip and the surface is the source of the oxyanions species. 15 The strong localization of the electrical field lines near the tip apex and the lateral confinement of the oxyanions species within the liquid meniscus give rise to a nanometer-size oxide dot. [16][17][18][19][20] The kinetics of the oxidation process is influenced by the generation of a space charge. [21][22][23] The model by Dagata et al. 21,24 considers two competing mechanisms, a fast oxidation process that applies to the initial stages ͑below 1 s͒ and a slower, indirect process that applies for longer oxidation times and involves space charge. Dubois and Bubendorff's model is based on a charge trapping-detrapping mechanism. 23 Most of the AFM oxidation nanolithography applications involve oxidation times below 1 s. Recently, local oxide patterns have been used as high resolution templates for the growth of functional materials such as protein carriers 7 or single molecule magnets. 25 The underlying mechanism behind the organization of molecular architectures is based on the electrostatic interactions between the charged or polarized molecules and the space charges trapped inside the local oxides. However, there is no experimental evidence that supports the existence of space charges for short oxidation times. In addition, the sign of the charge has not been measured.Here, we perform Kelvin probe force microscopy ͑KPFM͒ experiments to determine the space charge sign and density. The measurements establish the presence of a space charge build up during the earlier stages of the oxidation process ͑below 10 ms͒. The sign of the apparent space charge depends on the relative humidity inside the chamber where the KPFM measurements are performed. In dry conditions ͑N 2 gas environment͒ the observed charge is always negative. However, in the presence of wat...

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“…Various optoelectronic devices, such as lasers, detectors, filters and solar cells, are expected to benefit from this enhancement, which allows spectropolarimetric control over emission and detection processes 9,10 . Various nanostructure architectures for enhanced-field couplers have been explored in the literature, including bull's eye, bow-tie, C-aperture and periodic inductive and capacitive arrays [11][12][13] , fabricated by a wide variety of lithography techniques such as e-beam lithography, ion-beam lithography, nano-imprinting and interferometric lithography (IL) [14][15][16][17] . For this study, we choose a 2D periodic hole array, which is easy to fabricate using IL 17 .…”

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A monolithically integrated plasmonic infrared quantum dot camera

et al. 2011

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In the past few years, there has been increasing interest in surface plasmon-polaritons, as a result of the strong near-field enhancement of the electric fields at a metal-dielectric interface. Here we show the first demonstration of a monolithically integrated plasmonic focal plane array (FPA) in the mid-infrared region, using a metal with a two-dimensional hole array on top of an intersubband quantum-dots-in-a-well (DWELL) heterostructure FPA coupled to a read-out integrated circuit. Excellent infrared imagery was obtained with over a 160% increase in the ratio of the signal voltage (V s ) to the noise voltage (V n ) of the DWELL camera at the resonant wavelength of λ = 6.1 µm. This demonstration paves the way for the development of a new generation of pixel-level spectropolarimetric imagers, which will enable bio-inspired (for example, colour vision) infrared sensors with enhanced detectivity (D*) or higher operating temperatures.

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Nanofabrication by scanning probe microscope lithography: A review

Cited by 414 publications

References 98 publications

Nanopatterning of carbonaceous structures by field-induced carbon dioxide splitting with a force microscope

Nanopatterning of carbonaceous structures by field-induced carbon dioxide splitting with a force microscope

Nanoscale space charge generation in local oxidation nanolithography

A monolithically integrated plasmonic infrared quantum dot camera

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