Nanofabrication 2008
DOI: 10.1007/978-0-387-75577-9_2
|View full text |Cite
|
Sign up to set email alerts
|

Nanofabrication by Photons

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
3
0

Year Published

2012
2012
2024
2024

Publication Types

Select...
3
1

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(3 citation statements)
references
References 64 publications
0
3
0
Order By: Relevance
“…According to the previous research results, the surface form accuracy of each DUV lens should be 2 nm rms; and the MSFR error should be 0.3 nm rms [51][52][53][54][55][56]. As the diameter of an atom is 0.1-0.2 nm, the atoms on the surface need to be removed layer by layer if the size fluctuation range of the machined surface is in the subnanometer order, which is the ultimate target processing accuracy, namely, atomic-level accuracy.…”
Section: State-of-the-art Precision Levelmentioning
confidence: 95%
“…According to the previous research results, the surface form accuracy of each DUV lens should be 2 nm rms; and the MSFR error should be 0.3 nm rms [51][52][53][54][55][56]. As the diameter of an atom is 0.1-0.2 nm, the atoms on the surface need to be removed layer by layer if the size fluctuation range of the machined surface is in the subnanometer order, which is the ultimate target processing accuracy, namely, atomic-level accuracy.…”
Section: State-of-the-art Precision Levelmentioning
confidence: 95%
“…In UV NIL, a UV-curable liquid polymer resist is spread on a substrate and a transparent mold is pressed on it until the trenches are filled by the liquid resist. Afterwards, the polymer is cured into a solid film by UV exposure and then the mold is separated from the cured resist [14].…”
Section: Ag Hommentioning
confidence: 99%
“…Therefore, there is an urgent need to develop new nanofabrication methods (which should be based on the “bottom-up” approach), among which FEBID is one of the most promising, allowing controlled creation of nanostructures with nanometer resolution . Such methods , exploit the irradiation of nanosystems with collimated electron beams. These can be used to create specific structural motifs of metal NPs for catalytic and nanoelectrochemistry applications; , to fabricate metal nanostructures for sensors, nanoantennas, magnetic devices, and surface coatings; and to prepare thin films with tailored properties for electronic devices and other applications.…”
Section: Introductionmentioning
confidence: 99%