Nanofabrication by field-emission scanning probe lithography and cryogenic plasma etching

Lenk, Claudia; Hofmann, Martin; Lenk, Steve; Kaestner, Marcus; Ivanov, Tzvetan; Krivoshapkina, Yana; Nechepurenko, Diana; Volland, Burkhard E.; Holz, Mathias; Ahmad, Ahmad; Reum, Alexander; Wang, Chen; Jones, Mervyn; Durrani, Z. A. K.; Rangelow, Ivo W.

doi:10.1016/j.mee.2018.01.022

Cited by 14 publications

(6 citation statements)

References 36 publications

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“…36−38 Despite all the advantages in MACE, such a process based on wet etching was difficult to repeatedly achieve the same dimensions of the electrode and its cost is not inexpensive. 39,40 To repeatably fabricate the identical dimensions of the electrode but with an inexpensive price is crucial for the engineering of a photoanode. SU-8 as a UV curable material is widely utilized for replication of the silicon structure because of its easy processing and suitable mechanical properties.…”

Section: Discussionmentioning

confidence: 99%

Electrosprayed Thylakoid–Alginate Film on a Micro-Pillar Electrode for Scalable Photosynthetic Energy Harvesting

Kim

Hong

et al. 2020

ACS Appl. Mater. Interfaces

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Direct harvesting of electricity from photosynthesis is highly desired as an eco-friendly and sustainable energy harvesting technology. Photosynthetic apparatuses isolated from plants, such as thylakoid membranes (TMs), are deposited on an electrode by which photosynthetic electrons (PEs) are collected from water splitting. To enhance PE collection efficiency, it is critical to increase the electrochemical interfaces between TMs and the electrode. Considering the size of TMs to be around a few hundred nanometer, we hypothesize that an array of micropillar-shaped (MP) electrode can maximize the TM/ electrode interface area. Thus, we developed MP electrodes with different heights and investigated the electrospraying of TM−alginate mixtures to fill the gaps between MPs uniformly and conformally. The uniformity of the TM−alginate film and the interaction between the TM and the MP electrode were evaluated to understand how the MP heights and film quality influenced the magnitude of the PE currents. PE currents increased up to 2.4 times for an MP electrode with an A/R of 1.8 compared to a flat electrode, indicating increased direct contact interface between TMs and the electrode. Furthermore, to demonstrate the scalability of this approach, an array of replicated SU-8 MP electrodes was prepared and PE currents of up to 3.2 μA were monitored without a mediator under 68 mW/cm 2 . Finally, the PE current harvesting was sustained for 14 days without decay, demonstrating the long-term stability of the TM−alginate biophotoanodes.

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Section: Discussionmentioning

confidence: 99%

Electrosprayed Thylakoid–Alginate Film on a Micro-Pillar Electrode for Scalable Photosynthetic Energy Harvesting

Kim

Hong

et al. 2020

ACS Appl. Mater. Interfaces

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“…The sample was cooled to 150 K with the process undertaken at a pressure of 5 mTorr. Using this technique, precise pattern transfer of sub-20 nm patterns with high aspect ratios has been shown, with etch depths of 80 nm [46]. A small undercut occurs during etching, leading to a reduction in point-contact height for the narrowest neck widths ( Fig.…”

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confidence: 99%

Room-temperature single dopant atom quantum dot transistors in silicon, formed by field-emission scanning probe lithography

Durrani

Jones

Abualnaja

et al. 2018

Journal of Applied Physics

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Electrical operation of room-temperature (RT) single dopant atom quantum dot (QD) transistors, based on phosphorous atoms isolated within nanoscale SiO2 tunnel barriers, is presented. In contrast to single dopant transistors in silicon, where the QD potential well is shallow and device operation limited to cryogenic temperature, here, a deep (~2 eV) potential well allows electron confinement at RT. Our transistors use ~10 nm size scale Si/SiO2/Si pointcontact tunnel junctions, defined by scanning probe lithography and geometric oxidation.'Coulomb diamond' charge stability plots are measured at 290 K, with QD addition energy ~0.3 eV. Theoretical simulation gives a QD size of similar order to the phosphorous atom separation ~2 nm. Extraction of energy states predicts an anharmonic QD potential, fitted using a Morse oscillator-like potential. The results extend single-atom transistor operation to RT, enable tunnelling spectroscopy of impurity atoms in insulators, and allow the energy landscape for P atoms in SiO2 to be determined.

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Section: Reviewmentioning

confidence: 99%

Charged particle single nanometre manufacturing

Prewett¹,

Hagen²,

Lenk³

et al. 2018

Beilstein J. Nanotechnol.

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Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject of a recently completed European Union Project entitled “Single Nanometre Manufacturing: Beyond CMOS”. Scanning helium ion beam lithography has the advantages of virtually zero proximity effect, nanoscale patterning capability and high sensitivity in combination with a novel fullerene resist based on the sub-nanometre C60 molecule. The shot noise-limited minimum linewidth achieved to date is 6 nm. The second technology, focused electron induced processing (FEBIP), uses a nozzle-dispensed precursor gas either to etch or to deposit patterns on the nanometre scale without the need for resist. The process has potential for high throughput enhancement using multiple electron beams and a system employing up to 196 beams is under development based on a commercial SEM platform. Among its potential applications is the manufacture of templates for nanoimprint lithography, NIL. This is also a target application for the third and final charged particle technology, viz. field emission electron scanning probe lithography, FE-eSPL. This has been developed out of scanning tunneling microscopy using lower-energy electrons (tens of electronvolts rather than the tens of kiloelectronvolts of the other techniques). It has the considerable advantage of being employed without the need for a vacuum system, in ambient air and is capable of sub-10 nm patterning using either developable resists or a self-developing mode applicable for many polymeric resists, which is preferred. Like FEBIP it is potentially capable of massive parallelization for applications requiring high throughput.

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Nanofabrication by field-emission scanning probe lithography and cryogenic plasma etching

Cited by 14 publications

References 36 publications

Electrosprayed Thylakoid–Alginate Film on a Micro-Pillar Electrode for Scalable Photosynthetic Energy Harvesting

Electrosprayed Thylakoid–Alginate Film on a Micro-Pillar Electrode for Scalable Photosynthetic Energy Harvesting

Room-temperature single dopant atom quantum dot transistors in silicon, formed by field-emission scanning probe lithography

Charged particle single nanometre manufacturing

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