Nanofabrication and Characterization of Plasmonic Structures

Fu, Yongqi; Zong-wei, XU

doi:10.5772/26612

Cited by 3 publications

(3 citation statements)

References 19 publications

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“…The nanofabrication of plasmonic structures was recently reviewed by Fu et al [112]. Besides other popular lithography methods such as e-beam lithography, laser interference lithography, and the less-used nanosphere lithography (all followed by lift-off), IBL is a very widely used technique due to the convenience of creating grooves, cuts, holes, dimples, and small gaps directly by milling.…”

Section: Plasmonic Structuresmentioning

confidence: 99%

Direct-Write Ion Beam Lithography

Joshi‐Imre

Bauerdick

2014

Journal of Nanotechnology

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Patterning with a focused ion beam (FIB) is an extremely versatile fabrication process that can be used to create microscale and nanoscale designs on the surface of practically any solid sample material. Based on the type of ion-sample interaction utilized, FIB-based manufacturing can be both subtractive and additive, even in the same processing step. Indeed, the capability of easily creating three-dimensional patterns and shaping objects by milling and deposition is probably the most recognized feature of ion beam lithography (IBL) and micromachining. However, there exist several other techniques, such as ion implantation- and ion damage-based patterning and surface functionalization types of processes that have emerged as valuable additions to the nanofabrication toolkit and that are less widely known. While fabrication throughput, in general, is arguably low due to the serial nature of the direct-writing process, speed is not necessarily a problem in these IBL applications that work with small ion doses. Here we provide a comprehensive review of ion beam lithography in general and a practical guide to the individual IBL techniques developed to date. Special attention is given to applications in nanofabrication.

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Section: Plasmonic Structuresmentioning

confidence: 99%

Direct-Write Ion Beam Lithography

Joshi‐Imre

Bauerdick

2014

Journal of Nanotechnology

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“…Optical devices may be generally divided into two categories: single devices, such as an optical fibre (waveguide) (Bozhevolnyi, 2006;Califa, 2014) or logic circuits (Cohen, 2013(Cohen, , 2014; and an array of closely spaced structures (large matrices of circles, bowties, and others) that serve as a plasmonic platform (Fu, 2011, Salomon, 2013. Fabricating large matrices of nanostructures, including in plasmonics, poses multiple challenges -from maintaining high resolution over a large field of view (FOV; nanostructures that spread over hundreds microns) (Morrissey, 2005;Yao, 2010;Atiqah, 2012;Wilhelmi, 2012;Joshi-Imre, 2014), through reproducibility and accuracy of hundreds of structures at a time (Tseng, 2005;Yvonne, Xu, 2009Xu, , 2014, to system stability for extended writing.…”

Section: Introductionmentioning

confidence: 99%

“…Over the last few decades, nanostructure fabrication has drawn increasing technological interest, especially in the context of optical devices and plasmonics (Boyd, ; Li, ,b; Henzie, ; Fu, ; Cohen, ; Cohen, ). One of the major tools for fabricating nanostructures is based on focused ion beam (FIB), which is used to pattern materials from the microscale down to the nanoscale (Gierak, ; Enkrich, ; Alkemade, ).…”

Section: Introductionmentioning

confidence: 99%

Matrices pattern using FIB; ‘Out‐of‐the‐box’ way of thinking

Fleger

Gotlib-Vainshtein

Talyosef

2017

Journal of Microscopy

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Focused ion beam (FIB) is an extremely valuable tool in nanopatterning and nanofabrication for potentially high-resolution patterning, especially when refers to He ion beam microscopy. The work presented here demonstrates an 'out-of-the-box' method of writing using FIB, which enables creating very large matrices, up to the beam-shift limitation, in short times and with high accuracy unachievable by any other writing technique. The new method allows combining different shapes in nanometric dimensions and high resolutions for wide ranges.

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Micro-cones Array-Based Plasmonic Metasurface for Sensitive and Enhanced Raman Detection

Cui

Tian

et al. 2020

Plasmonics

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Nanofabrication and Characterization of Plasmonic Structures

Cited by 3 publications

References 19 publications

Direct-Write Ion Beam Lithography

Direct-Write Ion Beam Lithography

Matrices pattern using FIB; ‘Out‐of‐the‐box’ way of thinking

Micro-cones Array-Based Plasmonic Metasurface for Sensitive and Enhanced Raman Detection

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