Nanoenergetic Materials for MEMS: A Review

Abstract

OATAO is an open access repository that collects the work of Toulouse researchers and makes it freely available over the web where possible. This is an author-deposited version published in: http://oatao.univ-toulouse.fr/ Eprints ID : 2460To link to this article : URL : http://dx.Abstract-New energetic materials (EMs) are the key to great advances in microscale energy-demanding systems as actuation part, igniter, propulsion unit, and power. Nanoscale EMs (nEMs) particularly offer the promise of much higher energy densities, faster rate of energy release, greater stability, and more security (sensitivity to unwanted initiation). nEMs could therefore give response to microenergetics challenges. This paper provides a comprehensive review of current research activities in nEMs for microenergetics application. While thermodynamic calculations of flame temperature and reaction enthalpies are tools to choose desirable EMs, they are not sufficient for the choice of good material for microscale application where thermal losses are very penalizing. A strategy to select nEM is therefore proposed based on an analysis of the material diffusivity and heat of reaction. Finally, after a description of the different nEMs synthesis approaches, some guidelines for future investigations are provided.[2006-0259] Index Terms-Materials processing, materials science and technology, microelectromechanical devices, microelectromechanical system (MEMS), micropyrotechnics, nanoscale energetic materials (nEMs), propulsion, synthesis, thermal power generation. , where she is a Member of the Microsystems and Systems Integration (MIS) Group, Laboratoire d'Analyse et d'Architecture des Systèmes, in the MEMS department. Her research interests include microenergetic for MEMS, micropyrotechnical systems, and power MEMS for electrical generation. She is currently leading the power MEMS research area at LAAS, and her team proposes new concepts for actuation and energy on a chip. Authorized licensed use limited to: INP TOULOUSE. Downloaded on May 11, 2009 at 03:01 from IEEE Xplore. Restrictions apply.

Physiochemical Characterization of Iodine (V) Oxide Part II: Morphology and Crystal Structure of Particulate Films

“…Energetic films composed of multi-component fuel-oxidizer mixtures can be produced in a variety of ways, including a wide range of liquid and vapor based methods [12]. Aside from multi-layer physical or chemical vapor deposition [13][14][15][16][17], these methods generally involve some sort of a carrier fluid to combine, intermix, and transport the reagent materials to the deposition substrate.…”

“…Such environments vary broadly as well, ranging from a gentle mixing, stirring, or coalescence processes [38], to more intense milling [39], swaging, [40] or sonication processes [12,41]. Of all of these, sonication is one of the most commonly used, versatile, and significant in that it physically pulverizes solid constituents, typically in a liquid-solid slurry, into smaller fragments of a more uniform size and simultaneously increases the degree of intermixing when multiple components are present.…”

Effect of additives on CuO/Al nanothermite properties

“…Such a system is characterized by a high reaction temperature and a small amount of exhaust products. In contrast to micron-sized thermite systems, nanothermites exhibit a high burning rate and are capable of burning in microchannels of 0.1 mm and less [1][2][3][4].…”

“…), microelectromechanical systems (MEMS), dedicated fastening and connection of materials (nanoscale welding), etc. [1,[5][6]. The practical application is hindered by extremely high sensitivities to friction and electrostatic discharge comparable to some priming explosives [6][7][8][9].…”

Fabrication of a porous alumina mask on the large surface area of a semi-insulating semiconductor substrate

“…Fabrication of regularly ordered nanopores on the surface of a semiconductor is one of the fundamental processes for semiconductor devise fabrication and is widely used in the MEMS, 1) solar cells 2) and photonics 3) applications. One of the common schemes for this process is a dry etching with a mask prepared by photo-lithography.…”