Abstract:i ABSTRACT This dissertation focuses on the formation of nanocrystals and integration with high-k dielectrics to address the gate stack and voltage scaling issues for future generation flash memory. Several concepts for improved device performance were discussed, including the introduction of new materials, process development and novel device structures.The first part of the work introduces a simple technique for the formation of Ge nanocrystals embedded in Lu 2 O 3 high-k dielectric using pulsed laser deposi… Show more
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