2009
DOI: 10.1016/j.mee.2008.11.091
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Nanocones on transparent substrates for investigations in scanning probe microscopes

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Cited by 17 publications
(22 citation statements)
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“…[22][23][24][25][26][27] In this work arrays of gold nanocones in square lattices are fabricated on a glass substrate coated with a homogeneous 50 nm thick film of indium tin oxide (ITO) to avoid charge accumulation effects during electron beam lithography (EBL). [22][23][24][25][26][27] In this work arrays of gold nanocones in square lattices are fabricated on a glass substrate coated with a homogeneous 50 nm thick film of indium tin oxide (ITO) to avoid charge accumulation effects during electron beam lithography (EBL).…”
Section: Cone Fabricationmentioning
confidence: 99%
“…[22][23][24][25][26][27] In this work arrays of gold nanocones in square lattices are fabricated on a glass substrate coated with a homogeneous 50 nm thick film of indium tin oxide (ITO) to avoid charge accumulation effects during electron beam lithography (EBL). [22][23][24][25][26][27] In this work arrays of gold nanocones in square lattices are fabricated on a glass substrate coated with a homogeneous 50 nm thick film of indium tin oxide (ITO) to avoid charge accumulation effects during electron beam lithography (EBL).…”
Section: Cone Fabricationmentioning
confidence: 99%
“…As can be seen in Fig. 2(d), this nano-mask is roughly centred on the plateau and has a circular shape, which grants the final conical shape of the plasmonic nanostructure after mask transfer [22][23][24][25][26][27][28]. The height of the pillar as in Fig.…”
Section: Resultsmentioning
confidence: 75%
“…As discussed in [20][21][22][23], nanocones enable efficient light focusing through strong localisation of the plasmon field energy near their tips, which can have a radius of less than 20 nm [24]. The procedure follows previous work, where plasmonic nanocones were fabricated on AFTs by transfer of a platinum mask fabricated by focused electron-beam induced deposition (FEBID) and exploited as TERS probes [25,26].…”
Section: Introductionmentioning
confidence: 99%
“…[36][37][38][39] The (25 μm) 2 arrays of gold nanocones with different distances between the cones used in this study are fabricated by applying electron beam lithography using PMMA (polymethyl methacrylate) for the preparation of Al 2 O 3 etch masks by a lift-off process. The fabrication processes developed by the authors are based on the transfer of circular etch masks into a gold layer by argon ion milling, during which the conical shape of the nanostructures is formed.…”
Section: Methodsmentioning
confidence: 99%