Nanocolloidal microarrays on chemically patterned substrates

Self‐Assembly of Ordered Colloidal Nanoparticle Films in Few‐Micron Wide Laser‐Desorbed Lines of Octadecylsiloxane Monolayers on Silicon Oxide Surfaces

“…[10] Additionally, confining nanochannels have been used for quasi one-dimensional metallization. [11,12] Approaches for patterning comprise self-assembly of colloidal layers on photolithographically, [2,[10][11][12][13] or chemically [8,14,15] pre-structured solid substrates (e.g., silicon oxide) or soft-lithographically patterned poly(dimethylsiloxane) [16] as templates for the deposition of colloidal nanoparticles that have undergone a physical, [13] chemical, [2,14] or even no [5,15,16] specific functionalization. A particular technology for colloidal nanoparticle patterning was first described by Burmeister et al [17] and further developed by Kosiorek et al [18] and Hall et al [3] to achieve templates for sub-micron patterned metallization, known as "colloidal monolayer lithography" and used, e.g., for plasmonically active gratings.…”