“…It is worth noting that the proposed process is generic and might be very efficient for the production of nanostructures of a wide variety of alternative nonmetallic conductors, which are usually grown by sputter deposition, such as molybdenum nitride (MoN), tantalum nitride (TaN), ,, niobium nitride (NbN), In-doped tin oxide (ITO), ,, aluminum- or gallium-doped zinc oxide (AZO, GZO), ,,, niobium-doped titanium oxide (NTO), partly reduced molybdenum oxides MoO x ( x < 3), , and vanadium dioxide (VO 2 ), which exhibits a metal–insulator transition. , All these conductors have been proposed as alternative plasmonic materials, whose plasmonic activity spans the far-ultraviolet to medium-infrared range. ,,,,,− …”