2009
DOI: 10.1016/j.jphotochem.2008.10.007
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Nano-textured metallic surfaces for optical sensing and detection applications

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Cited by 35 publications
(32 citation statements)
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“…The particles act as nano-focusing lenses creating "hot-spots" in the electromagnetic field. Methods of controlling the shape, size, and ordering of nanoparticles, and their two-or three-dimensional (2D or 3D) arrangements provide a way to control the "hot-spots" [3][4][5][6]. Polarization and angular effects become important in the light field enhancement by plasmonic nano-focusing.…”
Section: Introductionmentioning
confidence: 99%
“…The particles act as nano-focusing lenses creating "hot-spots" in the electromagnetic field. Methods of controlling the shape, size, and ordering of nanoparticles, and their two-or three-dimensional (2D or 3D) arrangements provide a way to control the "hot-spots" [3][4][5][6]. Polarization and angular effects become important in the light field enhancement by plasmonic nano-focusing.…”
Section: Introductionmentioning
confidence: 99%
“…1(a)). Our modified checkerboard design, which allows for a simpler fabrication process, is different than the standard checkerboard pattern employing structures in 2D [15,16] and in 3D [29] form, which is shown to be a good SERS platform. The modified checkerboard with intentional gaps achieves highly reproducible results of high electric field enhancement with easy fabrication.…”
Section: Fabrication and Structural Characterizationmentioning
confidence: 99%
“…1(c), using electron beam deposition, a 5 nm thick chromium layer was coated on the substrate serving as the adhesion promoter for bottom gold layer, preventing charging effects during electron-beam lithography (EBL) process and making possible of imaging the structures after fabrication with scanning electron microscopy (SEM). As discussed in the literature, sidewall formation here can reduce the field enhancement [29]. To prevent the sidewall formation in the 3D-structure and facilitate the lift-off process for the 2D-structure, a bilayer poly(methyl methacrylate) (PMMA) film consisting of PMMA 495 K and PMMA 950 K molecular weight layers were spin-coated as the EBL resist, which provides undercut following the development step (as sketched in (I) of Fig.…”
Section: Fabrication and Structural Characterizationmentioning
confidence: 99%
“…[17][18][19] An adequate top-down approach to fabricate SERS arrays providing a reproducible field enhancement is electron beam lithography (EBL). [20][21][22][23][24][25][26][27][28][29][30] Recently, we investigated regular patterend nanostructures produced by means of EBL with respect to their use as highly reproducible SERS substrates for biochip applications. It was shown, that both LSPP and PSPP modes were excited at the metal dielectric interface, resulting in doubly resonant plasmonic arrays.…”
Section: Introductionmentioning
confidence: 99%