2017
DOI: 10.1007/s10854-017-7642-7
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Nano-structured WO3 layers sensitized with ALD Pt for quick detection of H2S

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Cited by 2 publications
(1 citation statement)
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“…The flexibility of this approach can be suggested by using various MOX gas-sensitive layers, using different technology methods-thin-film (vacuum) and thick-film (atmosphere pressure). For thin-film MOX gas-sensitive layers, thicknesses starting from 0.1 µm up to 10 µm [29] are typical, which can be obtained by various methods of vacuum deposition-PLD [30], DC [31], or RF [32] magnetron sputtering, ALD [33], LPCVD [34], but in the main parts of experiments using MOX layers thicknesses of several micrometers obtained by magnetron sputtering [35]. For thick-film technology, thicknesses from 5 µm up to 50 µm [36] are typically obtained through the use of several processes-screen printing [37], drop coating [38], spin coating [39], spray pyrolysis deposition [40], and inkjet printing [41].…”
Section: Discussionmentioning
confidence: 99%
“…The flexibility of this approach can be suggested by using various MOX gas-sensitive layers, using different technology methods-thin-film (vacuum) and thick-film (atmosphere pressure). For thin-film MOX gas-sensitive layers, thicknesses starting from 0.1 µm up to 10 µm [29] are typical, which can be obtained by various methods of vacuum deposition-PLD [30], DC [31], or RF [32] magnetron sputtering, ALD [33], LPCVD [34], but in the main parts of experiments using MOX layers thicknesses of several micrometers obtained by magnetron sputtering [35]. For thick-film technology, thicknesses from 5 µm up to 50 µm [36] are typically obtained through the use of several processes-screen printing [37], drop coating [38], spin coating [39], spray pyrolysis deposition [40], and inkjet printing [41].…”
Section: Discussionmentioning
confidence: 99%