“…The flexibility of this approach can be suggested by using various MOX gas-sensitive layers, using different technology methods-thin-film (vacuum) and thick-film (atmosphere pressure). For thin-film MOX gas-sensitive layers, thicknesses starting from 0.1 µm up to 10 µm [29] are typical, which can be obtained by various methods of vacuum deposition-PLD [30], DC [31], or RF [32] magnetron sputtering, ALD [33], LPCVD [34], but in the main parts of experiments using MOX layers thicknesses of several micrometers obtained by magnetron sputtering [35]. For thick-film technology, thicknesses from 5 µm up to 50 µm [36] are typically obtained through the use of several processes-screen printing [37], drop coating [38], spin coating [39], spray pyrolysis deposition [40], and inkjet printing [41].…”