Nano-hardness estimation by means of Ar+ ion etching

Bartali, Ruben; Micheli, V.; Gottardi, Gloria; Vaccari, Alessandro; Safeen, M.K.

doi:10.1016/j.tsf.2015.05.023

Cited by 10 publications

(3 citation statements)

References 23 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…An Ar + ion gun with an energy of a few kiloelectronvolts can be used to etch thin layers of films by a sputtering approach. 410 In this regard, two points should be considered. First, the input energy should be carefully controlled, since, if the sputtering energy is sufficiently high, the PCN films would easily be carbonized.…”

Section: Synthesis Of Single-layered Polymeric Carbonmentioning

confidence: 99%

See 1 more Smart Citation

Semiconducting Polymers for Oxygen Evolution Reaction under Light Illumination

et al. 2022

View full text Add to dashboard Cite

Sunlight-driven water splitting to produce hydrogen fuel has stimulated intensive scientific interest, as this technology has the potential to revolutionize fossil fuel-based energy systems in modern society. The oxygen evolution reaction (OER) determines the performance of overall water splitting owing to its sluggish kinetics with multielectron transfer processing. Polymeric photocatalysts have recently been developed for the OER, and substantial progress has been realized in this emerging research field. In this Review, the focus is on the photocatalytic technologies and materials of polymeric photocatalysts for the OER. Two practical systems, namely, particle suspension systems and film-based photoelectrochemical systems, form two main sections. The concept is reviewed in terms of thermodynamics and kinetics, and polymeric photocatalysts are discussed based on three key characteristics, namely, light absorption, charge separation and transfer, and surface oxidation reactions. A satisfactory OER performance by polymeric photocatalysts will eventually offer a platform to achieve overall water splitting and other advanced applications in a cost-effective, sustainable, and renewable manner using solar energy.

show abstract

Section: Synthesis Of Single-layered Polymeric Carbonmentioning

confidence: 99%

“…Note that the XPS depth profile can be used to characterize the entire film from bottom to top. An Ar + ion gun with an energy of a few kiloelectronvolts can be used to etch thin layers of films by a sputtering approach . In this regard, two points should be considered.…”

Section: Photoanodic Oxygen Evolution Reactionmentioning

confidence: 99%

Semiconducting Polymers for Oxygen Evolution Reaction under Light Illumination

et al. 2022

View full text Add to dashboard Cite

show abstract

“…It has been recognized already in the 1990's that DLC is also suitable as etch masks for integrated circuit fabrication already 39 , yet its use as hardmask has not proliferated. The low argon ion sputtering yield 40 and excellent chemical stability of DLC are much desired for the etching of all integrated optical materials etching such as LiNbO 3 , SiO 2 , BaTiO 3 , Si, and Si 3 N 4 as they limit mask erosion processes that determine surface roughness and lead to slanted waveguide sidewall angles.…”

Section: Resultsmentioning

confidence: 99%

High density lithium niobate photonic integrated circuits and lasers

Wang

Lihachev

Tan

et al. 2023

Preprint

View full text Add to dashboard Cite

Photonic integrated circuits are indispensable for data transmission within modern datacenters and pervade into multiple application spheres traditionally limited for bulk optics, such as LiDAR and biosensing1. New applications and higher performance are enabled by the diversification of optical waveguide materials past silicon-on-insulator. Of particular interest are ferroelectrics such as Lithium Niobate, which exhibit a large electro-optical Pockels effect enabling ultrafast and efficient modulation, but are difficult to process via dry etching2. For this reason, etching tightly confining waveguides - routinely achieved in silicon or silicon nitride - has not been possible. Diamond-like carbon (DLC) was discovered in the 1950s 3 and is a material that exhibits an amorphous phase, excellent hardness, and the ability to be deposited in nano-metric thin films. Its use today is pervasive, ranging from applications for hard disk surfaces 4 and medical devices 5 to low friction coatings for automotive components 6. It has excellent thermal, mechanical, and electrical properties, making it an ideal protective coating. Here we demonstrate that DLC is also a superior material for the manufacturing of next-generation photonic integrated circuits based on ferroelectrics, specifically Lithium Niobate on insulator (LNOI). Using DLC as a hard mask, we demonstrate the fabrication of deeply etched, tightly confining, low loss photonic integrated circuits with losses as low as 4 dB/m and Q-factor as high as 10 · 106. In contrast to widely employed ridge waveguides 7,8, this approach benefits from a more than 1 order of magnitude higher area integration density while maintaining efficient electro-optical modulation, low loss, and offering a route for efficient optical fiber interfaces. As a proof of concept, we demonstrate a frequency agile hybrid integrated III-V Lithium Niobate based laser with sub-kHz linewidth and tuning rate of 0.7 Peta-Hertz per second with excellent linearity and CMOS-compatible driving voltage. Our approach can herald a new generation of high density ferroelectric photonic integrated circuits, in particular for applications in coherent laser based ranging 9 and beamforming 10, optical communications 7, and classical 11 and quantum computing networks 12.

show abstract