Nano and Nanocomposite Superhard Coatings of Silicon Carbonitride and Titanium Diboride by Magnetron Sputtering

Abstract

Superhard coatings (hardness 420 GPa) are being widely researched, driven by the need to use the components under different combinations of environments. Complex properties such as low friction and low wear, increased life time, and increased toughness are required in the same coating. Nanocomposite and nanocoatings are promising materials to achieve them. In the present communication, the author presents research findings on hard nanocomposite and nanocoatings of silicon carbonitride (SiCN) and titanium diborides by magnetron sputtering on Si and steel substrates. XPS, atomic force microscopy, and nanoindentation studies on both the films showed that they possessed high hardness, modulus, and significant elastic recoveries after unloading. These properties can be attributed to nanocrystalline dispersions of carbon nitride and silicon nitride phases in the amorphous SiCN matrix in nanocomposite SiCN thin films, whereas in the case of the TiB 2 film, nanosize grains led to higher hardness.

Tris(diethylamino)silane—A new precursor compound for obtaining layers of silicon carbonitride

“…The chemical inertness, infusibility (~1873 K), and a high hardness of 20-42 GPa [1][2][3][4][5] of silicon carbonitride ceramics and layers make them promising for application in new microlectromechanical systems (MEMS) [6]. The good wetting [7], attractive tribological properties [8], and high corrosion resistance of these materials at high temperatures [9,10] suggest many other applications in applied industrial technologies.…”

Effect of Particle Size on the Electrophoretic Deposition of Hydroxyapatite Coatings: A Kinetic Study Based on a Statistical Analysis

“…Electrophoretic deposition (EPD) is successfully implemented for the fabrication of dense and uniform HA coatings on the substrates with various geometries . Moreover, EPD is more economically favorable technique among other methods such as plasma spray, sputtering, sol‐gel, and biomimetic . The basis of an EPD process is the migration of colloidal particles suspended in a liquid medium under the influence of an electric field (electrophoresis) and their deposition on an electrode …”

PECVD Synthesis of Silicon Carbonitride Layers Using Methyltris(diethylamino)silane as the New Single-Source Precursor

“…Presently, significant progress has been made in the synthesis of nonstoichiometric silicon carbonitride SiC x N y by both physical and chemical methods using different mixtures of simple compounds such as SiH 4 , CH 4 , NH 3 , H 2 , C 2 H 2 , C 3 H 8 , N 2 , and etc. [4][5][6][7][8][9][10][11][12] An alternative way of synthesis of silicon carbonitride films is through the use of low-toxicity single-source precursors containing all z E-mail: nadezhda@niic.nsc.ru the necessary chemical elements, such as Si, C, and N in one molecule. These compounds are of special interest because the molecular structure of the initial organosilicon compound controls the chemical and phase compositions as well as the microstructure of grown nonstoichiometric silicon carbonitride films as described E. Kroke et.al.…”