Multiwavelength interferometry and competing optical methods for the thermal probing of thin polymeric films

Vourdas, N.; Karadimos, G.; Goustouridis, D.; Gogolides, Εvangelos; Boudouvis, Andreas G.; Tortai, J.H.; Beltsios, K.; Raptis, Ioannis

doi:10.1002/app.25107

Cited by 15 publications

(6 citation statements)

References 42 publications

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“…Utilization of optically transparent casings for iCVD reactors enables real‐time determination of film thickness, allowing the user to terminate the deposition once the desired result has been achieved 5, 188, 252, 253. Single and multiple wavelength interferometry have also been used for in situ probing of the thermal properties of polymeric thin films 254, 255…”

Section: Characteristics Of Cvd Polymersmentioning

confidence: 99%

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

et al. 2010

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Chemical vapor deposition (CVD) polymerization utilizes the delivery of vapor-phase monomers to form chemically well-defined polymeric films directly on the surface of a substrate. CVD polymers are desirable as conformal surface modification layers exhibiting strong retention of organic functional groups, and, in some cases, are responsive to external stimuli. Traditional wet-chemical chain- and step-growth mechanisms guide the development of new heterogeneous CVD polymerization techniques. Commonality with inorganic CVD methods facilitates the fabrication of hybrid devices. CVD polymers bridge microfabrication technology with chemical, biological, and nanoparticle systems and assembly. Robust interfaces can be achieved through covalent grafting enabling high-resolution (60 nm) patterning, even on flexible substrates. Utilizing only low-energy input to drive selective chemistry, modest vacuum, and room-temperature substrates, CVD polymerization is compatible with thermally sensitive substrates, such as paper, textiles, and plastics. CVD methods are particularly valuable for insoluble and infusible films, including fluoropolymers, electrically conductive polymers, and controllably crosslinked networks and for the potential to reduce environmental, health, and safety impacts associated with solvents. Quantitative models aid the development of large-area and roll-to-roll CVD polymer reactors. Relevant background, fundamental principles, and selected applications are reviewed.

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Section: Characteristics Of Cvd Polymersmentioning

confidence: 99%

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

et al. 2010

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“…The nitroaromatic flow was then turned off, and the chamber was purged with clean N 2 for 5 min. The films' thickness changes due to swelling was monitored via single wavelength interferometry [41] using a 633 nm HeNe laser (JDS Uniphase). For resistance measurements, the wire leads were fed through the chamber's seals in order to log electrical resistance as a function of time with a standard multimeter.…”

Section: Methodsmentioning

confidence: 99%

Synthesis of Poly(4‐vinylpyridine) Thin Films by Initiated Chemical Vapor Deposition (iCVD) for Selective Nanotrench‐Based Sensing of Nitroaromatics

Tenhaeff

McIntosh

Gleason

2010

Adv Funct Materials

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A new nanoscale sensing concept for the detection of nitroaromatic explosives is described. The design consists of nitroaromatic‐selective polymeric layers deposited inside microfabricated trenches. As the layers are exposed to nitroaromatic vapors, they swell and contact each other to close an electrical circuit. The nitroaromatic selective polymer, poly(4‐vinylpyridine) (P4VP), is deposited in the trenches using initiated chemical vapor deposition (iCVD). P4VP is characterized for the first time as a selective layer for the absorption of nitroaromatic vapors. The Flory–Huggins equation is used to model the swelling response to nitroaromatic vapors. The Flory–Huggins interaction parameter for the P4VP–nitrobenzene system at 40 °C is 0.71 and 0.25 for P4VP–4‐nitrotoluene at 60 °C. Sensing of nitrobenzene vapors is demonstrated in a prototype device, while techniques to improve the performance of the design in terms of response time and sensitivities are described. Modeling shows that concentration and mass limits of detection of 0.95 ppb and 3 fg, respectively, can be achieved.

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“…Optical interferometry (OPTI) measurements were recorded on an experimental setup. − The OPTI method is applied for the in situ monitoring in a single run of glass transitions of thin polymeric films on Si wafers.The glass transition is monitored by the slope differentiation of the interference line, and T g is obtained at the intersection of the two linear parts. OPTI measurements were obtained exclusively from the first heating cycle.…”

Section: Methodsmentioning

confidence: 99%

Partially Fluorinated, Polyhedral Oligomeric Silsesquioxane-Functionalized (Meth)Acrylate Resists for 193 nm Bilayer Lithography

et al. 2006

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The influence of partial fluorination on the lithographic performance of photoresists based on (meth)acrylate terpolymers containing polyhedral oligomeric silsesquioxane (POSS) pendant groups is investigated in bilayer schemes for 193 nm lithography. For the first time the capability of POSS-functionalized resists for standard lithographic processing, including use of standard developer (0.26 N tetramethylammonium hydroxide) and industrial processing equipment is demonstrated. The optimized resists formulated exhibited high sensitivity (<10 mJ/cm 2 ) and potential for resolution performance comparable to mature 193 nm materials. The role of the fluorinated acid as a component in the terpolymer composition was crucial to the homogeneity of the resist material and its lithographic performance. Also, a photoacid generator (PAG) study revealed that the use of a highly hydrophobic PAG containing organic anion with a long fluorinated chain in the resist formulation improved further the homogeneity of the material and its lithographic performance. The adhesion of the highly fluorinated materials to the substrate is influenced by the type of polymeric underlayer used, whereas best results were obtained on a hard baked novolac polymer.

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Multiwavelength interferometry and competing optical methods for the thermal probing of thin polymeric films

Cited by 15 publications

References 42 publications

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

Synthesis of Poly(4‐vinylpyridine) Thin Films by Initiated Chemical Vapor Deposition (iCVD) for Selective Nanotrench‐Based Sensing of Nitroaromatics

Partially Fluorinated, Polyhedral Oligomeric Silsesquioxane-Functionalized (Meth)Acrylate Resists for 193 nm Bilayer Lithography

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