We describe a concept of the magnetoresistive medium comprising of a planar array of intermingled nanowires with pinned and unpinned magnetic moments. We propose a bottom up method of forming the medium and demonstrate the feasibility of the proposed approach. We present the results of the simulations of the magnetic moments in the nanowires under an external magnetic field to illustrate the concept. © 2008 American Institute of Physics. ͓DOI: 10.1063/1.2834371͔Typically a magnetoresistive element consists of separated magnetic pinned ͑PL͒ and free layers ͑FL͒. In these nanostructures, the magnetoresistive effect originates mainly from spin-dependent scattering at the interface between a PL/FL and a nonmagnetic spacer. 1 Alternatively, in magnetic tunneling junctions ͑MTJs͒, spin dependent tunneling through an insulating spacer leads to a large spin asymmetry and correspondingly to magnetoresistance. 2 Such giant magnetoresistance ͑GMR͒ and tunneling magnetoresistance ͑TMR͒ nanoelements are fabricated using a top down lithography-based process, leading to an out-of-plane oriented array of devices commonly operated in the current perpendicular to the plane mode.Recently, increasing attention has been paid to an alternative bulklike mechanism of spin dependent scattering due to domain walls ͑DWs͒ in magnetic nanowires. 3,4 In bulk structures, this mechanism leads to a relatively small magnetoresistive ͑MR͒ effect. This small effect is due to a strong dependence of MR on the DW thickness. This dependence has been investigated in detail theoretically, [5][6][7][8][9][10] showing that a very narrow DW leads to MR values on the order of 100%. Since DW thickness can be significantly reduced in narrow nanowires, nanoconstrictions, and nanocontacts, significant efforts have been recently devoted to the fabrication and characterization of such nanostructures. Typically, such structures are also fabricated using top-down lithographybased nanofabrication techniques. For the present discussion, it is important to note that, overall, the DW scattering mechanism is expected to lead to an order of magnitude smaller MR effect than spin dependent scattering in MTJs or GMR structures.Here, we propose the concept of a magnetoresistive element and fabrication approach which is attractive due to its relative simplicity, as it does not involve multiple lithography steps. Instead, we use the atomic terrace low angle shadowing ͑ATLAS͒ technique, which has the advantage of bottom-up fabrication. We discuss the concept of the MR nanostructure, which utilizes DW scattering where the MR is further enhanced by creating multiple DW's in a nanowire array traversed by the in-plane spin-polarized electron current. Contrary to a conventional approach of single nanowires, we propose using dense array of magnetic wires to stabilize the DW network.The proposed medium consists of a planar array of nanowires with a width of some 5 -50 nm ͑Fig. 1͒. Two types of nanowires are used, the so-called spacer nanowires, marked hatched, and magnetoresistive nan...