Multiscale Dewetting of Low-Molecular-Weight Block Copolymer Ultrathin Films

Leonard, Donovan N.; Russell, P. E.; Smith, Steven D.; Spontak, Richard J.

doi:10.1002/1521-3927(20020201)23:3<205::aid-marc205>3.0.co;2-x

Cited by 12 publications

(12 citation statements)

References 10 publications

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“…Green and co- workers reported that spinodal and rims structures similar to those found in the present study can form in thin films of a PS- b -PMMA diblock copolymer above the T ODT . In addition, Spontak and co-workers observed multiscale dewetting in low molecular weight styrene−isoprene diblock copolymer thin films at RT, which they attributed to the depression of the upper T g and T ODT . The major difference between the present triblock copolymer and other systems is that for our system, even though the T ODT is far above RT, a spinodal-like and impinged rims pattern without dewetting is observed at RT after ca.…”

Section: Resultsmentioning

confidence: 99%

Pattern Formation in Ultrathin Films of a Novel Dimethylsiloxane−Acrylate Triblock Copolymer

Han¹,

Cho²

2003

Macromolecules

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Section: Resultsmentioning

confidence: 99%

Pattern Formation in Ultrathin Films of a Novel Dimethylsiloxane−Acrylate Triblock Copolymer

Han¹,

Cho²

2003

Macromolecules

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“…Films with M h n e 22.6 kg/mol were dried under high vacuum at room temperature to avoid dewetting at high temperatures. 51 The film thicknesses were determined using standard spectroscopic ellipsometry. 52 For the measurements, a rotatinganalyzer spectral ellipsometer of the type V.A.S.E.…”

Section: Methodsmentioning

confidence: 99%

“…Longer annealing times and higher annealing temperatures were avoided because of the thermal instability of the PB block. Films with M̄ n ≤ 22.6 kg/mol were dried under high vacuum at room temperature to avoid dewetting at high temperatures …”

Section: Methodsmentioning

confidence: 99%

Lamellar Diblock Copolymer Thin Films Investigated by Tapping Mode Atomic Force Microscopy: Molar-Mass Dependence of Surface Ordering

et al. 2003

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Using tapping mode atomic force microscopy, we studied the influence of molar mass (13.9−183 kg/mol) on the lamellar orientation at the surface of thin films of symmetric polystyrene−polybutadiene diblock copolymers prepared via spin-coating and by slow solvent-casting. The ratio between film thickness and lamellar thickness was varied between 0.5 and 10. Whereas for film thicknesses between 1 and 10 times the lamellar thickness, a lamellar orientation parallel to the film surface is preferred for low molar masses (below ∼55 kg/mol), high molar mass samples (above ∼90 kg/mol) rather form lamellae oriented perpendicular to the surface. For film thicknesses equal to the lamellar thickness, the films do not exhibit any texture, whereas for film thicknesses equal to half the lamellar thickness, a weak surface structure could be observed. This is consistent with symmetric wetting, i.e., the same block adsorbs at both film interfaces, but their selectivity is only weak. Thus, entropic contributions like chain stretching along a wall and the enrichment of free chain ends at the interface become important, and both parallel and perpendicular orientations of lamellae in thin films can occur.

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“…On low wettability substrates, an additional fingering instability of hole rims during hole expansion was observed. The dewetting of block copolymer thin films has become attractive recently 25–28. Although most studies conducted to date have focused on ultrathin films composed of block copolymers in the intermediate‐ or strong‐segregation regimes, Green et al have examined the detwetting characteristics of copolymer films at a temperature above the order‐disorder transition 26.…”

Section: Introductionmentioning

confidence: 99%

“…Other groups have studied the dewetting process of low molecular‐weight block copolymer thin films and found that autophobic dewetting (i.e. a liquid does not spread on its own monolayer29, 30) occurred in these systems 25, 27…”

Section: Introductionmentioning

confidence: 99%

Multiscale dewetting of triblock copolymer thin film induced by solvent vapor

Zhu

Zhao

Liao

et al. 2005

J Polym Sci B Polym Phys

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Multiscale dewetting of poly(styrene‐b‐ethylene/butylenes‐b‐styrene) (SEBS) triblock copolymer thin films induced by volatile solvent vapor treatment were observed in this study. Film rupture occurred at first and produced macroscopic holes. Near‐regular droplets (which represented a compromise between complete disorder and perfect order) could be formed at the last stage. The mechanism of solvent‐driven dewetting was discussed by comparing with that of thermal‐induced dewetting. Similar to thermal‐induced dewetting, the block copolymer thin films initially break up through the nucleation of holes that perforated the films. The rapid growing holes became unstable and formed nonequilibrium fingering patterns. The films exhibit autophobic or autodewetting phenomena. The velocity of the holes growth was nearly a constant (3.3 μm/min). The stages of the dewetting were quite similar to that found for homopolymer and block copolymer thin films dewetting on solid or liquid substrates under thermal treatment. © 2005 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 43: 2874–2884, 2005

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Multiscale Dewetting of Low-Molecular-Weight Block Copolymer Ultrathin Films

Cited by 12 publications

References 10 publications

Pattern Formation in Ultrathin Films of a Novel Dimethylsiloxane−Acrylate Triblock Copolymer

Pattern Formation in Ultrathin Films of a Novel Dimethylsiloxane−Acrylate Triblock Copolymer

Lamellar Diblock Copolymer Thin Films Investigated by Tapping Mode Atomic Force Microscopy: Molar-Mass Dependence of Surface Ordering

Multiscale dewetting of triblock copolymer thin film induced by solvent vapor

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