2018
DOI: 10.1002/admt.201800061
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Multiscale and Uniform Liquid Metal Thin‐Film Patterning Based on Soft Lithography for 3D Heterogeneous Integrated Soft Microsystems: Additive Stamping and Subtractive Reverse Stamping

Abstract: to healthcare. [5,6] Unlike conventional solid-state electronics, soft electronics can be lightweight, stretchable, and reconfigurable, with biocompatible characteristics for skin-mountable and wearable sensing electronics. [7,8] Thereby, flexible and stretchable characteristics are achieved by using either 2D or 3D compliant wave-like, solid metal patterns [9,10] or elastic conductors based on conductive nanomaterials embedded in a polymer matrix. [11,12] An alternative approach to realize all-soft microsyste… Show more

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Cited by 37 publications
(47 citation statements)
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“…The height variations of the printed features along their length are characterized using white-light interferometry (Zygo NewView 7300). Overall, the average EGaIn heights, which were greater than 1 µm, are larger than those seen by Gozen et al [49] and considerably larger than those seen in Kim et al [50,51] For the Si stamps, in general, a larger line width results in a smaller height. Since the oxide skin thickness does not exceed only a few nanometers (e.g., between ≈0.5-2.5 nm [8] ), the observed variations likely arise from the variations in EGaIn volume rather than changes in the oxide layer thickness.…”
Section: Characterization Of Test Pattern Geometriescontrasting
confidence: 56%
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“…The height variations of the printed features along their length are characterized using white-light interferometry (Zygo NewView 7300). Overall, the average EGaIn heights, which were greater than 1 µm, are larger than those seen by Gozen et al [49] and considerably larger than those seen in Kim et al [50,51] For the Si stamps, in general, a larger line width results in a smaller height. Since the oxide skin thickness does not exceed only a few nanometers (e.g., between ≈0.5-2.5 nm [8] ), the observed variations likely arise from the variations in EGaIn volume rather than changes in the oxide layer thickness.…”
Section: Characterization Of Test Pattern Geometriescontrasting
confidence: 56%
“…The unwanted residue formation was one of the limitations of other EGaIn fabrication approaches [49][50][51] and has been addressed in our approach. The unwanted residue formation was one of the limitations of other EGaIn fabrication approaches [49][50][51] and has been addressed in our approach.…”
Section: Characterization Of Test Pattern Geometriesmentioning
confidence: 99%
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“…Being a liquid-phase conductor with a brittle oxide layer on the surface, the shape of EGaIn-filled microchannels can be easily changed in response to applied mechanical forces, with a new oxide layer being formed instantaneously on the EGaIn surface after deformation, thus making it shape reconfigurable 22 . The moldable characteristics of EGaIn have resulted in the development of a broad range of patterning methods based on lithography-enabled stamping and stencil printing [26][27][28][29][30][31][32][33] , microfluidic injection [34][35][36] , as well as additive [37][38][39] and subtractive [40][41][42][43][44][45] patterning processes. However, creating fine and uniform EGaIn thin-film patterns using current EGaIn patterning technologies remains a major technical challenge because of the high surface tension of EGaIn (γ = 624 mN m −1 ) 23 .…”
mentioning
confidence: 99%