Laser-Induced Damage in Optical Materials 2017 2017
DOI: 10.1117/12.2280561
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Multiple pulse nanosecond laser induced damage threshold on hybrid mirrors

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Cited by 3 publications
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“…Hence, the most common matrix for the fabrication of such sources is silica. It is characterized by a significant damage threshold of 0.2 J/cm 2 at 1550 nm and low attenuation up to the spectral range of about 2.2 µm [16][17][18][19]. Production of silica optical fibers, due to high processing temperatures (softening point above 1700 • C), doping of silica is limited to inorganic compounds only.…”
Section: Introductionmentioning
confidence: 99%
“…Hence, the most common matrix for the fabrication of such sources is silica. It is characterized by a significant damage threshold of 0.2 J/cm 2 at 1550 nm and low attenuation up to the spectral range of about 2.2 µm [16][17][18][19]. Production of silica optical fibers, due to high processing temperatures (softening point above 1700 • C), doping of silica is limited to inorganic compounds only.…”
Section: Introductionmentioning
confidence: 99%
“…To the best of our knowledge, this system still holds the world record of 1 kW of average output power with nanosecond pulses [11]. Many industrial applications, including laser peening and laser induced damage threshold, do not require high energy of 100 J but rather high average power and would greatly benefit from high repetition rate operation of the laser [12,13]. In order to meet these requirements, HiLASE team in cooperation with Central Laser Facility (CLF) has designed a laser amplifier with the goal to generate 10 J and 100 Hz repetition rate.…”
Section: Introductionmentioning
confidence: 99%