2014
DOI: 10.1063/1.4898807
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Multilevel unipolar resistive switching with negative differential resistance effect in Ag/SiO2/Pt device

Abstract: Bipolar and tri-state unipolar resistive switching behaviors in Ag/ZnFe2O4/Pt memory devices Appl. Phys. Lett. 101, 063501 (2012); 10.1063/1.4744950 Bipolar resistive switching performance of the nonvolatile memory cells based on ( AgI ) 0.2 ( Ag 2 MoO 4 ) 0.8 solid electrolyte filmsIn this paper, we report a multilevel unipolar resistive switching (RS) phenomenon with negative differential resistance (NDR) effect in Ag/SiO 2 /Pt sandwich structure. After positive electroforming process with low compliance cur… Show more

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Cited by 44 publications
(25 citation statements)
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“…In this case, the room temperature peak‐valley current ratio of 1.07 has been observed in the Ag/Melanin/SS memristive device. Similar to our results, the NDR effect has been reported earlier in many switching devices . In the present case, charge trapping and detrapping near the Ag/Melanin interface is responsible for the NDR effect …”
Section: Resultssupporting
confidence: 93%
“…In this case, the room temperature peak‐valley current ratio of 1.07 has been observed in the Ag/Melanin/SS memristive device. Similar to our results, the NDR effect has been reported earlier in many switching devices . In the present case, charge trapping and detrapping near the Ag/Melanin interface is responsible for the NDR effect …”
Section: Resultssupporting
confidence: 93%
“…Due to the trapping and detrapping effect, the multi-island tunneling systems show resistive switching behavior with NDR effect. 72,73 Although it may be possible that such a mechanism is taking place, our data and modeling analysis suggests F-N tunneling mechanism under that conditions examined. As a result, future detailed studies are required to understand the resistive switching behavior of TiO 2 -CZTS systems.…”
Section: Resistance = Aementioning
confidence: 87%
“…37,38 In the RRAM, it is one of the conduction process reported by several studies. 39,40 Although the tunneling phenomenon starts at 1 MV/cm, the F–N tunneling probability always dominates at the higher E > 10 MV/cm. 41 The thickness of the modified Al 2 O 3 tunnel barrier (TB modified ) at higher E can be approximated by the following equation…”
Section: Discussionmentioning
confidence: 99%