Multilevel analysis of the relief of a surface sample obtained by atomic force microscopy techniques

Uzhegova, N.I.; Свистков, А. Л.

doi:10.7242/1999-6691/2016.9.3.30

Cited by 3 publications

(1 citation statement)

References 8 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In processing DEMs obtained by AFM measurements, approaches known in geomorphometry are occasionally used, in particular, the decomposition of the original surface into trend, low‐, and high‐frequency components and their separate analysis (Uzhegova & Svistkov, 2016). However, more advanced methods of geomorphometry, based on the theory of the topographic surface in gravity and the apparatus of differential geometry have not yet been used for the analysis of such DEMs.…”

Section: Introductionmentioning

confidence: 99%

Geomorphometry and microelectronic metrology: Converged realms

Dedkova

Florinsky

2023

Transactions in GIS

View full text Add to dashboard Cite

This article discusses the application of geomorphometric methods in microelectronic metrology. Six typical microelectronic items were geomorphometrically analyzed using their digital elevation models with nano‐ and micrometer‐range resolution and elevation difference: (1) a silicon–quartz structure; (2) a mechanically polished silicon wafer; (3) a photovoltaic blend sample; (4) an X‐ray optical element (a fused quartz spherical concave substrate); (5) a Bosch process‐formed, 20 aluminum layered membrane; and (6) a silicon–glass assembly with a volumetric defect. Geomorphometric modeling increases significantly the visibility and informativeness of data presentation, allowing to identify effectively the spatial distribution of nano‐ and microforms of the surface of microelectronic items. Geomorphometric methods provide an opportunity to study the size, location, and characteristic features of nano‐ and microtopographic inhomogeneities of microelectronic items using maps of minimum, maximum, mean, and unsphericity curvatures as well as other morphometric variables.

show abstract

Section: Introductionmentioning

confidence: 99%

Geomorphometry and microelectronic metrology: Converged realms

Dedkova

Florinsky

2023

Transactions in GIS

View full text Add to dashboard Cite

show abstract

Technique for Analyzing Volumetric Defects Using Digital Elevation Model of a Surface

Dedkova

Florinsky

Gusev

et al. 2021

Russ J Nondestruct Test

View full text Add to dashboard Cite

Geomorphometric modeling of nanotopography using data from atomic force microscopy

Dedkova¹,

Florinsky²

2022

Proceedings of the International Conference "Mathematical Biology and Bioinformatics"

View full text Add to dashboard Cite

The article presents results of geomorphometric modeling of the nanotopography based on measurements by atomic force microscopy (AFM). As initial data, we used measurements of the surface of a PTB7:PC 71 BM photovoltaic blend sample. The size of the analyzed scanning area of the sample was 2 x 2 μm; the elevation difference of the sample was 109 nm. A digital elevation model (DEM) of the sample included 66,049 points (a matrix 257 x 257); a DEM grid spacing was 7.8 nm. For geomorphometric modeling, we applied a universal spectral analytical method using Chebyshev polynomials and Fejér summation. We derived digital models and maps of twelve morphometric variables of the complete system of curvatures, such as: horizontal, vertical, difference, horizontal excess, vertical excess, accumulation, ring, minimum, maximum, mean, Gaussian curvatures and unsphericity, as well as curvedness and shape indices. Geomorphometric modeling and analysis of the nanotopography measured by AFM make it possible to reveal subtle nanotopographic inhomogeneities that are not displayed on the original DEM maps.

show abstract

Multilevel analysis of the relief of a surface sample obtained by atomic force microscopy techniques

Cited by 3 publications

References 8 publications

Geomorphometry and microelectronic metrology: Converged realms

Geomorphometry and microelectronic metrology: Converged realms

Technique for Analyzing Volumetric Defects Using Digital Elevation Model of a Surface

Geomorphometric modeling of nanotopography using data from atomic force microscopy

Contact Info

Product

Resources

About